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Methanofullerene Phenyl-C61-Butyric-Acid-Methyl-Ester ([60]PCBM) is an effective solution processable n-type organic semiconductor. [60]PCBM is the most commonly used n-type semiconductor in organic photovoltaics (OPVs).1 It also shows promise in other applications, including photodetectors2 and organic field effect transistors (OFETs).3 Fabrication of thin film organic electronics devices is complex, with slight variations of molecular structures having profound effects on film morphology and charge transport. To help you optimize the performance of your devices, Sigma-Aldrich is pleased to offer a library of PCBMs that includes [60]PCBM analogs based on higher fullerenes (C70 and C84), as well as derived by chemical alterations of the addend moiety to vary solubility and electronic properties. Members of the library have shown advantages in different devices and will help you explore and experiment in your research. Different purity grades of [60]PCBM are available for device scale-up, research, and exploratory work. Tables 1 and 2 below provide application, properties, and product information to help you choose the PCBMs.
Note: Do you need polymer semiconductors to complete your devices? Follow this link for the related web page that will help your choice:
New Polymer Semiconductors.
Table 1: Sigma-Aldrich PCBM Library
| Product Number |
Product Name |
Structure |
Applications |
Add to Cart |
| 684430 |
Phenyl-C61-Butyric-Acid-Methyl
Ester, [60]PCBM, 99% (scale-up grade) |

|
Best-known PCBM compound. Effective n-type semiconductor soluble in organic solvents. Used for solar cells (OPVs), thin-film transistors (OFETs),
and photodetectors.1-3 |
|
|
684449 |
Phenyl-C61-Butyric-Acid-Methyl
Ester, [60]PCBM, 99.5% (research grade) |
|
|
684457 |
Phenyl-C61-Butyric-Acid-Methyl
Ester, [60]PCBM, 99.9% (for exploratory work) |
|
|
684465 |
Phenyl-C71-Butyric-Acid-Methyl Ester, [70]PCBM, 99% |
 |
[70]PCBM has increased optical absorption in the visible region compared to [60PCBM. This can lead to improved light-harvesting in OPVs,4 especially in combination with large bandgap donors like MDMO-PPV
(546461) |
|
|
684473 |
Phenyl-C85-Butyric-Acid-Methyl Ester, [84]PCBM, 99% |
 |
[84]PCBM has the strongest visible absorption and highest electron accepting ability of available PCBMs. Very low LUMO
makes [84]PCBM a promising material for OFETs.5 |
|
| 685321 |
Phenyl-C61-Butyric-Acid-Butyl Ester, PCBB, [60]PCB-C4> 97% |
 |
PCBB is slightly more soluble than [60]PCBM, resulting in improved film morphology and higher performing OPV devices deposited from certain organic solvents (THF,
p-xylene).6 |
|
| 684481 |
Phenyl-C61-Butyric-Acid-Octyl Ester, PCBO,
[60]PCB-C8 , 99% |
 |
Highly soluble PCBM suitable for applications as a
general electron acceptor and scavenger in organic solvents and blends. |
|
|
688215 |
Thienyl-C61-Butyric-Acid-Methyl Ester,
[60]ThCBM, 99% |
 |
PCBM derivative optimized for optimal blending with polythiophene
p-type semiconductors, such as P3HT (669067).7 |
|
|
684503 |
Pentadeuterophenyl-C61-Butyric-Acid-Methyl Ester, d5-PCBM, 99% |

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Isotopically labeled PCBM for spectroscopic (e.g. SIMS) studies of film morphology and diffusion in thin-film organic devices.
|
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Table 2: Properties of selected PCBMs *
| Product |
[60]PCBM |
[70]PCBM |
[84]PCBM |
[60]ThCBM |
| Product Number |
684430
684449
684457 |
684465 |
684473 |
688215 |
| First Reduction Potential, E1/2 (V) |
-1.078 |
-1.089 |
-0.730 |
-1.08 |
Solubility (mg/ml)
· toluene
· p-xylene
· chlorobenzene
· chloroform
· o-dichlorobenzene
(ODCB) |
10
5
25
25
30
|
20
10
40
30
70 |
|
5 5 10 20 20 |
Molar Extinction Coefficients
(mol-1 cm-1)
400 nm
650 nm |
4,900
<1,000 |
19,000
2,000 |
28,000
4,000 |
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* From Kronholm, D.; Hummelen, J. Material Matters
2007, Vol. 2 No. 3.
References
1. Gunes, S.; Neugebauer, H.; Sacriciftci, N. Chem. Rev. 2007, 107, 1324.
2. Rauch, T.; Henseler, D.; Schilinky, P.; Waldauf, C.; Hauch, J.; Brabec, C.
Proc. of the 4th IEEE Conf. on Nanotechnology 2004, 632.
3. Anthopoulous, T.; de Leeuw, D.; Cantatore, E.; van’t Hof, P.; Alma, J.; Hummelen, J.C.
J. Appl. Phys. 2005, 98, 503.
4. Wienk, M.; Kroon, J.; Verhees, W.; Knol, J.; Hummelen, J.; van Hal, P.; Janssen, A. Angew.
Chem. Int. Ed. 2003, 42, 3371. 5. Anthopoulous, T.; Kooistra, F.; Wondergem, H.; Kronholm, D.; Hummelen, J.; de Leeuw, D.
Adv. Materials 2006, 18, 1679.
6. Zheng, L.; Zhou, Q.; Deng, X.; Yuan, M.; Yu, G.; Cao, Y. J. Phys. Chem. B
2004, 108, 11921.
7. Popescu, M.; van’t Hof, P.; Sieval, A.; Jonkman, H.; Hummelen, J. Appl. Phys. Lett.
2006, 89, 213507.
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