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We provide high-quality purified precursors for research in semiconductor and thin film research and development. Our product selection is classified by primary use, either as ALD (Atomic Layer Deposition) and CVD (Chemical Vapor Deposition) precursors. Use the links below to find the products you need and be sure to check back for our special offers and new products!
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 | Volatile precursors for a variety of CVD applications. Applications include metal and ceramic thin and thick films. Products are listed by primary deposition element atom, from Aluminum to Zirconium. |
 | Precursors shown to undergo stepwise, layer-by-layer reactions on surfaces to build up monolayer thick films for the most demanding applications. |
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