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Sigma-Aldrich will meet your materials needs for lithography and nanopatterning through our complete line of monomers, polymers, resins, inks, surfactants, silanes and related products. We offer resist materials, photoacid generators (PAGs), polyelectrolytes for self-assembled monolayers (SAMS), fluorine-containing monomers for 157 nm UV resists, and our high-purity norbornadiene. Research and bulk quantities of all materials are available. Hydrophile-Lipophile Balance Numbers (HLB)
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