 To support production and R&D operations, our state-of-the-art tools provide analytical testing to the highest sensitivities for a wide range of contaminants. We offer an extensive array of techniques to fully characterize compounds and measure impurities to the lowest of levels.
Analytical instruments are operated by our highly-skilled and trained analytical chemists. Instruments are validated using tools such as Gage R&R to monitor performance and ensure confidence in results.
Primary analytical techniques include FT-NMR, ICP-OES/MS, HR-ICP-MS (includes high-resolution), but many more are used to provide complete data for each product. TGA, vapour pressure measurement and particle counting are also employed to provide complete characterization or additional data on every product.
SAFC Hitech has developed unique handling and sample preparation procedures that, coupled with our clean room environments, ensure optimal performance from the analytical tools utilized, ensuring background levels of contamination are minimized to achieve the low detection limits required.
Specific tests can be reviewed in our silicon semiconductor, compound semiconductor and performance chemicals sections.
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