EMAIL THIS PAGE TO A FRIEND

The International journal of oral & maxillofacial implants

Decontamination of titanium implant surface and re-osseointegration to treat peri-implantitis: a literature review.


PMID 23057016

Abstract

To review the literature on decontamination of titanium implant surfaces following peri-implantitis and the effect of various cleaning methods on re-osseointegration. An electronic search of the literature at PubMed was conducted on the studies published between 1966 and October 2010. In vitro, animal, and clinical studies were included. Of 597 studies retrieved, 74 manuscripts were selected for the review. Various implant surface decontamination methods using various chemical and mechanical agents have been suggested for treatment and re-osseointegration following periimplantitis. It has been shown that re-osseointegration of contaminated implant surfaces is possible; this largely depends upon the surface of the implant and the types of decontamination techniques and bone regenerative materials used. Complete re-osseointegration cannot be achieved by surface decontamination alone. Titanium implants with titanium plasma-sprayed or sandblasted and acid-etched surfaces may be effectively decontaminated by applying chlorhexidine and saline-soaked gauze or by repeated rinsing with these solutions. Both mechanical and chemical decontamination techniques should be applied alongside regenerative surgical procedures to obtain optimum re-osseointegration and successfully treat peri-implantitis. In recent years, lasers and photodynamic therapy have shown minor beneficial results, which need to be confirmed by long-term clinical studies with comparable groups.

Related Materials

Product #

Image

Description

Molecular Formula

Add to Cart

IRMM531A
Titanium, IRMM® certified Reference Material, 0.1 mm foil
Ti
IRMM531B
Titanium, IRMM® certified Reference Material, 0.5 mm foil
Ti
IRMM531C
Titanium, IRMM® certified Reference Material, 0.5 mm wire
Ti
305812
Titanium, crystalline, 5-10 mm, ≥99.99% trace metals basis (purity exclusive of Na and K content)
Ti
433667
Titanium, evaporation slug, diam. × L 6.3 mm × 6.3 mm, ≥99.99% trace metals basis
Ti
369489
Titanium, foil, thickness 2.0 mm, 99.7% trace metals basis
Ti
348805
Titanium, foil, thickness 0.5 mm, 99.99% trace metals basis
Ti
267481
Titanium, foil, thickness 0.25 mm, 99.99% trace metals basis
Ti
267503
Titanium, foil, thickness 0.25 mm, 99.7% trace metals basis
Ti
460397
Titanium, foil, thickness 0.127 mm, ≥99.99% trace metals basis
Ti
348791
Titanium, foil, thickness 0.127 mm, 99.7% trace metals basis
Ti
348813
Titanium, foil, thickness 0.1 mm, 99.99% trace metals basis
Ti
348821
Titanium, foil, thickness 0.05 mm, 99.99% trace metals basis
Ti
348848
Titanium, foil, thickness 0.025 mm, 99.98% trace metals basis
Ti
268496
Titanium, powder, −100 mesh, 99.7% trace metals basis
Ti
366994
Titanium, powder, <45 μm avg. part. size, 99.98% trace metals basis
Ti
513415
Titanium, nanoparticles, dispersion, <100 nm particle size, in mineral oil, 98.5% trace metals basis
Ti
347132
Titanium, rod, diam. 6.35 mm, 99.99% trace metals basis
Ti
266051
Titanium, rod, diam. 6.35 mm, 99.7% trace metals basis
Ti
268526
Titanium, sponge, 3-19 mm, 99.5% trace metals basis
Ti
348856
Titanium, wire, diam. 2.0 mm, 99.99% trace metals basis
Ti
266035
Titanium, wire, diam. 1.0 mm, 99.99% trace metals basis
Ti
267902
Titanium, wire, diam. 0.81 mm, 99.7% trace metals basis
Ti
348864
Titanium, wire, diam. 0.5 mm, 99.99% trace metals basis
Ti
460400
Titanium, wire, diam. 0.25 mm, 99.7% trace metals basis
Ti
266019
Titanium, wire, diam. 0.127 mm, 99.99% trace metals basis
Ti
749044
Titanium, sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis
Ti
767506
Titanium, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis
Ti
GF57414179
Titanium, rod, 1000mm, diameter 6mm, annealed, 99.6+%
Ti
GF72693883
Titanium, rod, 100mm, diameter 1.5mm, annealed, 99.6+%
Ti