Disilane
electronic grade
DOWNLOAD MSDS (PDF)-
CAS Number 1590-87-0
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Linear Formula Si2H6
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Molecular Weight 62.22
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EC Number 216-466-5
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MDL number MFCD00054678
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PubChem Substance ID 24869889
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Popular Documents: Specification Sheet (PDF)
Properties
| Related Categories | CVD and ALD Precursors by Metal, Chemical Synthesis, Gases, Materials Science, Micro/NanoElectronics, |
| grade | electronic grade |
| form | gas |
| impurities | ≤50 ppm Higher silanes |
| <0.2 ppm Chlorosilanes | |
| <1 ppm Argon (Ar) + Oxygen (O2) | |
| <1 ppm Carbon dioxide (CO2) | |
| <1 ppm Nitrogen (N2) |
Description
Features and Benefits
Disilane is used for the deposition of amorphous silicon, epitaxial silicon and silicon based dielectrics via rapid low-temperature chemical vapor depsition (LTCVD).2 Disilane is also used in the epitaxial growth of SiGe films by molecular beam epitaxy (MBE) in conjunction with solid sources of germanium.3 Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.4
General description
Atomic number of base material: 14 Silicon
Packaging
20 g in ss cylinder
Application
Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.1
Recommended products
Stainless steel regulators Z527416 or Z527424 are recommended.
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