463043 Aldrich


electronic grade



Related Categories CVD and ALD Precursors by Metal, Chemical Synthesis, Gases, Materials Science, Micro/NanoElectronics,
grade   electronic grade
form   gas
impurities   ≤50 ppm Higher silanes
  <0.2 ppm Chlorosilanes
  <1 ppm Argon (Ar) + Oxygen (O2)
  <1 ppm Carbon dioxide (CO2)
  <1 ppm Nitrogen (N2)
  <1 ppm THC
  <1 ppm Water
  <5 ppm Siloxanes
bp   −14.5 °C(lit.)
mp   −132.6 °C(lit.)
transition temp   critical temperature 150.9 °C


Features and Benefits

Disilane is used for the deposition of amorphous silicon, epitaxial silicon and silicon based dielectrics via rapid low-temperature chemical vapor depsition (LTCVD).2 Disilane is also used in the epitaxial growth of SiGe films by molecular beam epitaxy (MBE) in conjunction with solid sources of germanium.3 Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.4

General description

Atomic number of base material: 14 Silicon


20 g in stainless steel cylinder


Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.1

Recommended products

Stainless steel regulators Z527416 or Z527424 are recommended.

Price and Availability

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electronic grade, ≥99.9%

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Safety & Documentation

Safety Information

Signal word 
UN 3161 2.1
WGK Germany 
Flash Point(F) 
<50 °F
Flash Point(C) 
<10 °C
Protocols & Articles


High Purity Deposition Gases

High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Catalog, Chemical vapor deposition, Deposition

High Purity Metalorganic Precursors for CPV Device Fabrication

Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Ravi Kanjolia
Material Matters Volume 5 Article 4
Keywords: Absorption, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Vaporization

Peer-Reviewed Papers


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1. J. Appl. Physiol. 81, 205, (1997)

2. Lin, H.-Y. et. al. Solid-State Electron 39, 1731, (1996)

3. Wado, H. et. al. J. Cryst. Growth 169, 457, (1996)

4. Huang, G. W. et. al. J. Appl. Physiol. 81, 205, (1997)

Merck 14,3356

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