|Related Categories||CVD and ALD Precursors by Metal, Chemical Synthesis, Gases, Materials Science, Micro/NanoElectronics,|
|impurities||≤50 ppm Higher silanes|
|<0.2 ppm Chlorosilanes|
|<1 ppm Argon (Ar) + Oxygen (O2)|
|<1 ppm Carbon dioxide (CO2)|
|<1 ppm Nitrogen (N2)|
|<1 ppm THC|
|<1 ppm Water|
|<5 ppm Siloxanes|
|transition temp||critical temperature 150.9 °C|
Disilane is used for the deposition of amorphous silicon, epitaxial silicon and silicon based dielectrics via rapid low-temperature chemical vapor depsition (LTCVD).2 Disilane is also used in the epitaxial growth of SiGe films by molecular beam epitaxy (MBE) in conjunction with solid sources of germanium.3 Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.4
Atomic number of base material: 14 Silicon
20 g in ss cylinder
Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.1
Stainless steel regulators Z527416 or Z527424 are recommended.
Certificate of Analysis
|Symbol||GHS02, GHS04, GHS07, GHS08|
|Precautionary statements||P210-P261-P280-P305 + P351 + P338-P342 + P311-P410 + P403|
|Personal Protective Equipment||Eyeshields, Faceshields, Gloves, half-mask respirator (US), multi-purpose combination respirator cartridge (US)|
|Hazard Codes (Europe)||F,Xn|
|Risk Statements (Europe)||17-20/21-36/37/38-42|
|Safety Statements (Europe)||16-24-26-36/37/39|
|RIDADR||UN 3161 2.1|
|Flash Point(F)||<50 °F|
|Flash Point(C)||<10 °C|
High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Chemical vapor deposition, Deposition
Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Material Matters Volume 5 Article 4
Keywords: Absorption, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Vaporization
1. J. Appl. Physiol. 81, 205, (1997)
2. Lin, H.-Y. et. al. Solid-State Electron 39, 1731, (1996)
3. Wado, H. et. al. J. Cryst. Growth 169, 457, (1996)
4. Huang, G. W. et. al. J. Appl. Physiol. 81, 205, (1997)
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