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725528 Aldrich

Tetrakis(ethylmethylamido)zirconium(IV)

packaged for use in deposition systems

Synonym: TEMAZ, Tetrakis(ethylmethylamino)zirconium(IV)

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Description

Frequently Asked Questions

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General description

Atomic number of base material: 40 Zirconium

Packaging

10 g in ss cylinder

Protocols & Applications

Precursors Packaged for Depositions Systems

Price and Availability

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Tetrakis(dimethylamido)<WBR>zirconium(IV)

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Tetrakis(ethylmethylamido)<WBR>zirconium(IV)

≥99.99% trace metals basis

Zirconium(IV) dibutoxide(bis-<WBR>2,4-<WBR>pentanedionate) solution

25 wt. % (in 1-butanol/toluene), 99.9% trace metals basis

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
WGK Germany 
3
Flash Point(F) 
50 °F
Flash Point(C) 
10 °C

Protocols & Articles

Articles

Dye-Sensitized and Perovskite Solar Cells: Interface Engineering by Atomic Layer Deposition

Valerio Zardetto,1 Francesco Di Giacomo,2 Thomas M. Brown,2 Aldo Di Carlo,2 Alessandra D’Epifanio,3 Silvia Licoccia,3 Erwin Kessels,1 Mariadriana Creatore1* 1Department of Applied Physics, Eindhoven ...
Keywords: Atomic layer deposition, Calorimetry, Capillary electrophoresis, Catalysis, Chemical vapor deposition, Deposition, Electronics, Materials Science, Microscopy, Photovoltaics, Positron Emission Tomography, Recombination, Reductions, Scanning electron microscopy, Semiconductor, Separation, Sol-gel, Solar cells

High Purity Metalorganic Precursors for CPV Device Fabrication

Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Simon Rushworth
Material Matters Volume 5 Article 4
Keywords: Absorption, Capabilities, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Protocols, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Tools, Usage, Vaporization

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of ...
Dr. Douwe Monsma, Dr. Jill Becker
Material Matters 2006, 1.3, 5.
Keywords: Applications, Atomic layer deposition, Automotive, Catalysis, Ceramics, Chemical vapor deposition, Deposition, Electronics, Infrared spectroscopy, Ion Exchange, Nanomaterials, Semiconductor, Solar cells, Tissue microarrays

Related Content

ALD Cylinders for Pyrophoric Precursors [VIDEO]

Aldrich Materials Science offers a variety of precursor materials for use in Atomic Layer Deposition, or ALD. ALD uses consecutive, self-limiting reactions to deposit thin films of controlled thickne...
Keywords: Atomic layer deposition, Deposition, Materials Science

Peer-Reviewed Papers

References

Set your institution to view full text papers.

Won, S-J.; Kim, J-Y.; Choi, G-J.; Heo, J.; Hwang, C. S.; Kim, H. J. Mater. Chem. 21, 4374, (2009)

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