|Related Categories||40: Zirconium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis,|
|bp||81 °C/0.1 mmHg(lit.)|
|density||1.049 g/mL at 25 °C(lit.)|
Certificate of Analysis
|Precautionary statements||P210-P231 + P232-P261-P305 + P351 + P338-P422|
|Hazard Codes (Europe)||F,Xi|
|Risk Statements (Europe)||11-14/15-36/37/38|
|Safety Statements (Europe)||16-26-36|
|Flash Point(F)||50 °F|
|Flash Point(C)||10 °C|
Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Material Matters Volume 5 Article 4
Keywords: Absorption, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Vaporization
Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of ...
Dr. Douwe Monsma, Dr. Jill Becker
Material Matters 2006, 1.3, 5.
Keywords: Atomic layer deposition, Automotive, Catalysis, Ceramics, Chemical vapor deposition, Deposition, Electronics, Infrared spectroscopy, Ion Exchange, Nanomaterials, Semiconductor, Solar cells, Tissue microarrays
Aldrich Materials Science offers a variety of precursor materials for use in Atomic Layer Deposition, or ALD. ALD uses consecutive, self-limiting reactions to deposit thin films of controlled thickne...
Keywords: Atomic layer deposition, Deposition, Materials Science
Won, S-J.; Kim, J-Y.; Choi, G-J.; Heo, J.; Hwang, C. S.; Kim, H. J. Mater. Chem. 21, 4374, (2009)
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
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