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257222 Aldrich

Trimethylaluminum

97%

Synonym: Aluminum trimethanide, TMA

  • CAS Number 75-24-1

  • Linear Formula (CH3)3Al

  • Molecular Weight 72.09

  •  Beilstein Registry Number 3587197

  •  EC Number 200-853-0

  •  MDL number MFCD00008252

  •  PubChem Substance ID 24855575

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Properties

Related Categories Aluminum, CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics,
vapor pressure   69.3 mmHg ( 60 °C)
assay   97%
form   liquid
bp   125-126 °C(lit.)
  128-130 °C/50 mmHg
mp   15 °C(lit.)
density   0.752 g/mL at 25 °C(lit.)

Description

Other Notes

Storage below 20°C may cause crystallization.

Packaging

100 g in Sure-Pac™

Application

TMA is used in a Ziegler Natta catalyst for polymerization and hydrogenation. TMA is mainly used for the production of methylaluminoxane, such as metalorganic chemical vapor deposition (MOCVD) of:
• Al2O3 using TMA and O2 precursors.1,2
• Al4C3 layers have been grown on Al2O3 (0001) using TMA and methane as source materials for aluminum and carbon.3

General description

Trimethylaluminum (TMA) is the most reactive and volatile among all organoaluminium compounds. It is extremely pyrophoric. It acts as a highly reactive reducing and alkylating agent.

Recommended products

Angled septum-inlet adapter Z118206 or straight septum-inlet adapter, 6mm I.D. inlet, Z118141 or straight septum-inlet adapter, 13mm I.D. inlet, Z118192 is recommended.

Price and Availability

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Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
Supplemental Hazard Statements 
Reacts violently with water.
RIDADR 
UN 3394 4.3(4.2) / PGI
WGK Germany 
nwg
RTECS 
BD2204000

Documents

Certificate of Analysis

Certificate of Origin

Protocols & Articles

Articles

ALD — A Versatile Tool for Nanostructuring

The acronym ALD stands for atomic layer deposition. Although the process was developed during the 1970s, ALD remained more of a niche process, since initially most applications of this technique were...
Mato Knez
Material Matters 2008, 3.2, 28
Keywords: Adsorption, Applications, Atomic layer deposition, Chemical vapor deposition, Deposition, Diffusion, Electronics, Environmental, Material Matters, Methods, Nanomaterials, Nanotechnology, Nanotubes, PAGE, Reductions, Support, Thin film deposition, Tissue microarrays

Acids and Bases

Acids and bases have been used by chemists for centuries, and are among the most fundamental reagents employed in synthetic organic chemistry. This Aldrich product line ranges from Brønsted and Lewis...
Chemfiles Volume 1 Article 3

Dye-Sensitized and Perovskite Solar Cells: Interface Engineering by Atomic Layer Deposition

Valerio Zardetto,1 Francesco Di Giacomo,2 Thomas M. Brown,2 Aldo Di Carlo,2 Alessandra D’Epifanio,3 Silvia Licoccia,3 Erwin Kessels,1 Mariadriana Creatore1* 1Department of Applied Physics, Eindhoven ...
Keywords: Atomic layer deposition, Calorimetry, Capillary electrophoresis, Catalysis, Chemical vapor deposition, Deposition, Electronics, Materials Science, Microscopy, Photovoltaics, Positron Emission Tomography, Recombination, Reductions, Scanning electron microscopy, Semiconductor, Separation, Sol-gel, Solar cells

Peer-Reviewed Papers

References

Set your institution to view full text papers.

1. Metalorganic chemical vapor deposition of Al2O3 using trimethylaluminum and O2 precursors: Growth mechanism and crystallinity Liu X, et al. J. Cryst. Growth 408, 78-84, (2014)

2. Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion Oili ME, et al. Thin Solid Films 552, 124-135, (2014)

3. Photo-induced current and its degradation in Al4C3/Al2O3 (0001) grown by metalorganic chemical vapor deposition Kim D, et al. Thin Solid Films 557, 216-221, (2014)

Beil. 4,IV,4397

Fieser 8,506 / Fieser 15,341 / Fieser 17,372

Aldrich MSDS 1, 1784:C / Corp MSDS 1 (2), 3479:D / RegBook 1 (2), 3043:A / Sax 6, 178 / Structure Index 1, 481:C:5

Related Products

septum inlet adapter

Product #

Description

Add to Cart

Z118206 Angled septum-inlet adapter, brass, inlet I.D. 6 mm × 6 mm
Z118141 Straight septum-inlet adapter, inlet I.D. 6 mm, brass
Z118192 Straight septum-inlet adapter, inlet I.D. 13.9 mm, brass

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