|Related Categories||Aluminum, CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics,|
|vapor pressure||69.3 mmHg ( 60 °C)|
|128-130 °C/50 mmHg|
|density||0.752 g/mL at 25 °C(lit.)|
Storage below 20°C may cause crystallization.
100 g in Sure-Pac™
Angled septum-inlet adapter Z118206 or straight septum-inlet adapter, 6mm I.D. inlet, Z118141 or straight septum-inlet adapter, 13mm I.D. inlet, Z118192 is recommended.
Certificate of Analysis
|Precautionary statements||P222-P223-P231 + P232-P280-P370 + P378-P422|
|Supplemental Hazard Statements||Reacts violently with water.|
|Personal Protective Equipment||Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter|
|Hazard Codes (Europe)||F,C|
|Risk Statements (Europe)||14-17-34|
|Safety Statements (Europe)||16-43-45|
|RIDADR||UN 3394 4.2/PG 1|
|Flash Point(F)||1.4 °F|
|Flash Point(C)||-17 °C|
The acronym ALD stands for atomic layer deposition. Although the process was developed during the 1970s, ALD remained more of a niche process, since initially most applications of this technique were...
Material Matters 2008, 3.2, 28
Keywords: Adsorption, Atomic layer deposition, Chemical vapor deposition, Deposition, Diffusion, Electronics, Environmental, Nanomaterials, Nanotechnology, Nanotubes, PAGE, Reductions, Thin film deposition, Tissue microarrays
Acids and bases have been used by chemists for centuries, and are among the most fundamental reagents employed in synthetic organic chemistry. This Aldrich product line ranges from Brønsted and Lewis...
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Fieser 8,506 / Fieser 15,341 / Fieser 17,372
Aldrich MSDS 1, 1784:C / Corp MSDS 1 (2), 3479:D / RegBook 1 (2), 3043:A / Sax 6, 178 / Structure Index 1, 481:C:5
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