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396354 Aldrich

Tetramethylgermanium

98%

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Properties

Related Categories CVD and ALD Precursors by Metal, Chemical Synthesis, Germanium, Materials Science, Micro/NanoElectronics,
vapor pressure   6.74 psi ( 20 °C)
InChI Key   ZRLCXMPFXYVHGS-UHFFFAOYSA-N
assay   98%
form   liquid
refractive index   n20/D 1.389(lit.)
bp   43-44 °C/740 mmHg(lit.)
mp   −88 °C (dec.)(lit.)
density   0.978 g/mL at 25 °C(lit.)

Description

Packaging

5 g in ampule

Application

CVD precursor to germanium oxide thin films.

Price and Availability

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
Precautionary statements 
RIDADR 
UN 1993BF 3 / PGII
WGK Germany 
3
RTECS 
LY5345000
Flash Point(F) 
-34.6 °F
Flash Point(C) 
-37 °C
Protocols & Articles

Articles

High Purity Deposition Gases

High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Catalog, Chemical vapor deposition, Deposition

Peer-Reviewed Papers
15

References

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Z693847 Scienceware® Break-Safe ampule opener

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94791 SnapIT Ampule Opener, Regular, for 1-2ml, 5-10ml, 10-15ml ampoules
43917 SnapIT Ampule Opener, large, for 5-10ml, 10-15ml, 20-25ml ampoules

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