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40213 Aldrich

Hydrofluoric acid

semiconductor grade PURANAL (Honeywell 17736), 49.5-50.5%

Synonym: HF

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Properties

Related Categories Acids, Acids & Bases, Chemical Synthesis, Electronic Chemicals, Inorganic Acids,
grade   semiconductor grade PURANAL (Honeywell 17736)
vapor density   1.27 (vs air)
vapor pressure   25 mmHg ( 20 °C)
InChI Key   KRHYYFGTRYWZRS-UHFFFAOYSA-N
assay   49.5-50.5%
CofA   specification on request
density   1.15 g/mL at 25 °C(lit.)

Description

Application

Industrial uses of HF include etching or polishing glass, ceramics and silicon surfaces. HF may be used to etch silica capillaries for it behave as a filter and an integrated nanofluidic device for the stacking of DNA and proteins. Dentin and ceramic inlays may be etched with HF for better adhesive bonding. Nanohydroxyapatite was etched with 0.5%HF prior to measuring its morphological and mechanical properties.

General description

HF is a colorless inorganic acid. Hydrogen fluoride may be formed by reacting calcium fluoride and sulfuric acid at 200oC. The fluoride in the acid has very high affinity to silicon, making it useful in etching or removal of silicon.

Legal Information

PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH

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