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40287 Aldrich

Hydrogen peroxide solution

semiconductor grade MOS PURANAL (Honeywell 17937), ≥30%

  • CAS Number 7722-84-1

  • Empirical Formula (Hill Notation) H2O2

  • Molecular Weight 34.01

  •  Beilstein Registry Number 3587191

  •  MDL number MFCD00011333

  •  PubChem Substance ID 57649964

Purchase

Properties

Related Categories Chemical Synthesis, Electronic Chemicals, Materials Science, Micro/NanoElectronics, Oxidizing Agents,
grade   semiconductor grade MOS PURANAL (Honeywell 17937)
vapor pressure   23.3 mmHg ( 30 °C)
InChI Key   MHAJPDPJQMAIIY-UHFFFAOYSA-N
assay   ≥30%
CofA   specification on request
shelf life   ~2 yr
concentration   25-35%
density   1.110 g/cm3
storage temp.   2-8°C

Description

Application

Semiconductor grade hydrogen peroxide was used to etch TiN 2 and GaAs structures.

General description

Hydrogen peroxide is a strong oxidizer. It may be produced industrially by anthraquinone oxidation. it is used in semiconductor industry essentially for cleaning silicon wafers, removal of photoresists and to etch metallic copper on printed circuit boards. Ultrapurification of hydrogen peroxide by reverse osmosis has been reported in detail.

Legal Information

PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH

Price and Availability

Safety & Documentation

Safety Information

Symbol 
GHS05  GHS05
Signal word 
Danger
Hazard statements 
Precautionary statements 
RIDADR 
UN 2014 8(5.1) / PGII
WGK Germany 
1

Documents

Certificate of Analysis

Protocols & Articles
Peer-Reviewed Papers
15

References

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