EMAIL THIS PAGE TO A FRIEND
463094 Aldrich

Trimethylboron

electronic grade, ≥98.35%

Purchase

Properties

Related Categories CVD and ALD Precursors by Metal, Chemical Synthesis, Gases, Materials Science, Micro/NanoElectronics,
grade   electronic grade
InChI Key   WXRGABKACDFXMG-UHFFFAOYSA-N
assay   ≥98.35%
form   gas
impurities   <1 ppm Oxygen (O2)
  <1.5% Dimethylethylborane [B(CH3)2C2H5]
  <10 ppm Carbon dioxide (CO2)
  <10 ppm Nitrogen (N2)
  <100 ppm Methane (CH4)
  <1000 ppm Trimethylamine (TMA)
  <50 ppm Hydrogen (H2)
bp   −20.2 °C(lit.)
mp   −161.5 °C(lit.)

Description

Application

Precursor to boron carbide thin films by chemical vapor deposition (CVD).

Trimethylboron is used as an organometallic precursor for the CVD of boron-carbon containing films and as a boron source in the deposition of borophosphosilicate glass (BPSG).

Packaging

10 g in stainless steel cylinder

Recommended products

Stainless steel regulators Z527416 or Z527424 are recommended.

Price and Availability

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
Precautionary statements 
RIDADR 
UN 3160PIHB 2.1(2.3)
WGK Germany 
1
Protocols & Articles

Articles

High Purity Deposition Gases

High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Catalog, Chemical vapor deposition, Deposition

Peer-Reviewed Papers
15

References

Set your institution to view full text papers.
Related Products

Technical Service:

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Bulk Ordering & Pricing:

Need larger quantities for your development, manufacturing or research applications?