|assay||9-11% (balance is deuterium)|
|concentration||10% in D2|
Diborane gas is used primarily as a p-type dopant in the deposition of epitaxial and amorphous silicon thin films. The unique properties of diborane-d6 can result in increased device performance and reliability.
48 L in steel cylinder
Stainless steel regulators Z527416 or Z527424 are recommended.
Certificate of Analysis
|Hazard statements||H220-H280-H301 + H311 + H331-H315-H319-H335|
|Precautionary statements||P210-P261-P280-P301 + P310-P305 + P351 + P338-P311|
|Hazard Codes (Europe)||T|
|Risk Statements (Europe)||23/24/25-36/37/38|
|Safety Statements (Europe)||9-16-36/37/39-45|
|RIDADR||UN 1953 2.3|
High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Chemical vapor deposition, Deposition
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