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463140 Aldrich

Diborane-d6

10% in helium, electronic grade

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Properties

Related Categories CVD and ALD Precursors by Metal, Chemical Synthesis, Gases, Materials Science, Micro/NanoElectronics,
grade   electronic grade
InChI Key   NTJHUEGHVSASEP-RVWRRERJSA-N
assay   9-11% (balance is helium)
concentration   10% in helium
bp   −92.5 °C(lit.)
mass shift   M+6

Description

Application

Diborane gas is used primarily as a p-type dopant in the deposition of epitaxial and amorphous silicon thin films. The unique properties of diborane-d6 can result in increased device performance and reliability.

Packaging

24 L in stainless steel cylinder

Recommended products

Stainless steel regulators Z527416 or Z527424 are recommended.

Price and Availability

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
RIDADR 
UN 1953PIHA 2.3(2.1)
WGK Germany 
3
Protocols & Articles

Articles

High Purity Deposition Gases

High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Catalog, Chemical vapor deposition, Deposition

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