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463426 Aldrich

Trimethylboron-d9

electronic grade, 99.4% (CP), 99 atom % D

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Properties

Related Categories Boron, CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics,
grade   electronic grade
vapor density   2.3 (vs air)
InChI Key   WXRGABKACDFXMG-GQALSZNTSA-N
isotopic purity   99 atom % D
assay   99.4% (CP)
bp   −20.2 °C(lit.)
mp   −161.5 °C(lit.)
mass shift   M+9

Description

Application

The deposition of trimethylboron-d9 derived boron-carbon films can result in increased device performance.

Packaging

5 g in stainless steel cylinder

Recommended products

Stainless steel regulators Z527416 or Z527424 are recommended.

Price and Availability

Safety & Documentation

Safety Information

RIDADR 
UN 3160PIHA 2.3(2.1)
Protocols & Articles

Articles

High Purity Deposition Gases

High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Catalog, Chemical vapor deposition, Deposition

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