|Related Categories||CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics,|
|assay||≥99.99% trace metals basis|
|density||1.252 g/mL at 25 °C(lit.)|
Atomic number of base material: 73 Tantalum
5 mL in ampule
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packaged for use in deposition systems
electronic grade, ≥95% (CP), ≥99.99% trace metals basis
Certificate of Analysis
|Precautionary statements||P231 + P232-P280-P305 + P351 + P338-P310-P422|
|Supplemental Hazard Statements||Reacts violently with water.|
|Personal Protective Equipment||Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter|
|Hazard Codes (Europe)||C|
|Risk Statements (Europe)||10-14/15-34|
|Safety Statements (Europe)||26-36/37/39-43-45|
|RIDADR||UN 3398 4.3/PG 2|
|Flash Point(F)||114.8 °F|
|Flash Point(C)||46 °C|
Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Material Matters Volume 5 Article 4
Keywords: Absorption, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Vaporization
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