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597775 Aldrich

Trimethylaluminum

electronic grade, ≥99.9999% (ultra pure)

Synonym: Aluminum trimethanide, TMA

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Properties

Related Categories Aluminum, CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors More...
grade   electronic grade
vapor pressure   69.3 mmHg ( 60 °C)
InChI Key   JLTRXTDYQLMHGR-UHFFFAOYSA-N
assay   ≥99.9999% (ultra pure)
form   liquid
bp   125-126 °C(lit.)
mp   15 °C(lit.)
density   0.752 g/mL at 25 °C(lit.)

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Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
Supplemental Hazard Statements 
Reacts violently with water.
RIDADR 
UN 3394 4.3(4.2) / PGI
WGK Germany 
nwg
RTECS 
BD2204000
Protocols & Articles

Articles

Tutorial in Microelectronics and Nanoelectronics

Barrier Materials and Precursors High κ Dielectric Materials Deposition Techniques Chemical Vapor Deposition (CVD) Atomic Layer Deposition (ALD)
Keywords: Adhesion, Atomic layer deposition, Chemical reactions, Chemical vapor deposition, Chromatin immunoprecipitation, Deposition, Diffusion, Gas chromatography, Inductively coupled plasma, Ligands, Mass spectrometry, Melting, Microelectronics, Nuclear magnetic resonance spectroscopy, Oxidations, Reductions, Semiconductor, Solvents, Substitutions, Tissue microarrays, transformation

Peer-Reviewed Papers
15

References

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