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663301 Aldrich

Trimethylaluminum

packaged for use in deposition systems

Synonym: Aluminum trimethanide, TMA

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Properties

Related Categories 13: Aluminium, Aluminum, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Chemical Synthesis,
vapor pressure   69.3 mmHg ( 60 °C)
form   liquid
bp   125-126 °C(lit.)
mp   15 °C(lit.)
density   0.752 g/mL at 25 °C(lit.)

Description

Frequently Asked Questions

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General description

Atomic number of base material: 13 Aluminum

Packaging

25 g in ss cylinder

Protocols & Applications

High Purity Metalorganic Precursors for CPV Device Fabrication

Precursors Packaged for Depositions Systems

Price and Availability

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Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
Supplemental Hazard Statements 
Reacts violently with water.
Hazard Codes (Europe) 
F,C
Risk Statements (Europe) 
Safety Statements (Europe) 
16-43-45
RIDADR 
UN 3394 4.3(4.2) / PGI
WGK Germany 
nwg
RTECS 
BD2204000

Protocols & Articles

Articles

ALD — A Versatile Tool for Nanostructuring

The acronym ALD stands for atomic layer deposition. Although the process was developed during the 1970s, ALD remained more of a niche process, since initially most applications of this technique were...
Mato Knez
Material Matters 2008, 3.2, 28
Keywords: Adsorption, Applications, Atomic layer deposition, Chemical vapor deposition, Deposition, Diffusion, Electronics, Environmental, Material Matters, Methods, Nanomaterials, Nanotechnology, Nanotubes, PAGE, Reductions, Support, Thin film deposition, Tissue microarrays

High Purity Metalorganic Precursors for CPV Device Fabrication

Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Simon Rushworth
Material Matters Volume 5 Article 4
Keywords: Absorption, Capabilities, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Protocols, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Tools, Usage, Vaporization

Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers

Atomic layer deposition (ALD) techniques have emerged in the last ten years to meet various needs including semiconductor device miniaturization, conformal deposition on porous structures and coating...
Steven M. George, Byunghoon Yoon
Material Matters 2008, 3.2, 34.
Keywords: Atomic layer deposition, Biochemistry, Chemical reactions, Condensations, Deposition, Ligands, Polymerization reactions, Semiconductor, Sequences, Support, Tissue microarrays

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of ...
Dr. Douwe Monsma, Dr. Jill Becker
Material Matters 2006, 1.3, 5.
Keywords: Applications, Atomic layer deposition, Automotive, Catalysis, Ceramics, Chemical vapor deposition, Deposition, Electronics, Infrared spectroscopy, Ion Exchange, Nanomaterials, Semiconductor, Solar cells, Tissue microarrays

Related Content

ALD Cylinders for Pyrophoric Precursors [VIDEO]

Aldrich Materials Science offers a variety of precursor materials for use in Atomic Layer Deposition, or ALD. ALD uses consecutive, self-limiting reactions to deposit thin films of controlled thickne...
Keywords: Atomic layer deposition, Deposition, Materials Science

Peer-Reviewed Papers

References

Set your institution to view full text papers.

Beil. 4,IV,4397

Fieser 8,506 / Fieser 15,341 / Fieser 17,372

Aldrich MSDS 1, 1784:C / Corp MSDS 1 (2), 3479:D / RegBook 1 (2), 3043:A / Sax 6, 178 / Structure Index 1, 481:C:5

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