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668885 Aldrich

Bis(tert-butylimino)bis(dimethylamino)tungsten(VI)

packaged for use in deposition systems

Synonym: BTBMW

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Properties

Related Categories 74: Tungsten, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics,
InChI Key   JVCWKXBYGCJHDF-UHFFFAOYSA-N
form   liquid
bp   81 °C/0.02 mmHg(lit.)
density   1.305 g/mL at 25 °C(lit.)

Description

Frequently Asked Questions

Frequently Asked Questions are available for this Product.

Application

Precursor for the deposition of tungsten carbide and -nitride by atomic layer deposition.

General description

Atomic number of base material: 74 Tungsten

Packaging

10 g in stainless steel cylinder

Protocols & Applications

Precursors Packaged for Depositions Systems

Price and Availability

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
RIDADR 
UN 3398 4.3 / PGI
WGK Germany 
3
Flash Point(F) 
185 °F
Flash Point(C) 
85 °C

Frequently Asked Questions

Which document(s) contains shelf-life or expiration date information for a given product?
If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis. These documents are located on the product detail page under Useful Links & Tools. Click on the following link to search for a Certificate of Analysis. Please click the following link to see the details on our Product Dating Information.
How do I get lot-specific information or a Certificate of Analysis?
A Certificate of Analysis is available by lot number and can be obtained through our Advanced Search Option: http://www.sigmaaldrich.com/catalog/AdvancedSearchPage.do
How do I find price and availability?
There are several ways to find pricing and availability for our products.  Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote.  USA customers:  1-800-325-3010 or view local office numbers. 
What is the Department of Transportation shipping information for this product?
Transportation information can be found in Section 14 of the product's (M)SDS. To access the shipping information for this material, use the link on the product detail page for the product, or search here. 
My question is not addressed here, how can I contact Technical Service for assistance?
Use the option to the right to "Ask a Question" by email of a Technical Service Scientist.
Can the empty deposition cylinders be refilled?
Yes, we are able to refill these cylinders through our SAFC Hitech group.  Please contact our Technical Service department by email at techserv@sial.com, and they will forward you to the appropriate SAFC Hitech representative for a quote.
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Protocols & Articles

Articles

High Purity Metalorganic Precursors for CPV Device Fabrication

Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Ravi Kanjolia
Material Matters Volume 5 Article 4
Keywords: Absorption, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Vaporization

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of ...
Dr. Douwe Monsma, Dr. Jill Becker
Material Matters 2006, 1.3, 5.
Keywords: Applications, Atomic layer deposition, Automotive, Catalysis, Ceramics, Chemical vapor deposition, Deposition, Electronics, Infrared spectroscopy, Ion Exchange, Nanomaterials, Semiconductor, Solar cells, Tissue microarrays

Related Content

ALD Cylinders for Pyrophoric Precursors [VIDEO]

Aldrich Materials Science offers a variety of precursor materials for use in Atomic Layer Deposition, or ALD. ALD uses consecutive, self-limiting reactions to deposit thin films of controlled thickne...
Keywords: Atomic layer deposition, Deposition, Materials Science

Peer-Reviewed Papers
15

References

Related Products

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