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668990 Aldrich

Tris(diethylamido)(tert-butylimido)tantalum(V)

packaged for use in deposition systems

Synonym: TBTDET, Tris(diethylamino)(tert-butylimino)tantalum(V)

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Properties

Related Categories 73: Tantalum, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics,
InChI Key   YYKBKTFUORICGA-UHFFFAOYSA-N
form   liquid
density   1.252 g/mL at 25 °C(lit.)

Description

Frequently Asked Questions

Frequently Asked Questions are available for this Product.

General description

Atomic number of base material: 73 Tantalum

Packaging

10 g in stainless steel cylinder

Protocols & Applications

Precursors Packaged for Depositions Systems

Price and Availability

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
Supplemental Hazard Statements 
Reacts violently with water.
RIDADR 
UN3398 - DOT UN3399 class 4.3 - PG 2 - Organometallic substance, liquid, water-reactive, HI: all (not BR)
WGK Germany 
3
Flash Point(F) 
114.8 °F
Flash Point(C) 
46 °C
Protocols & Articles

Articles

FePt Nanogranular Films for High Density Heat-assisted Magnetic Recording

Kazuhiro Hono National Institute for Materials Research Tsukuba 305-0047, Japan Email: kazuhiro.hono@nims.go.jp
Keywords: Deposition, Nucleic acid annealing

High Purity Metalorganic Precursors for CPV Device Fabrication

Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Ravi Kanjolia
Material Matters Volume 5 Article 4
Keywords: Absorption, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Vaporization

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of ...
Dr. Douwe Monsma, Dr. Jill Becker
Material Matters 2006, 1.3, 5.
Keywords: Applications, Atomic layer deposition, Automotive, Catalysis, Ceramics, Chemical vapor deposition, Deposition, Electronics, Infrared spectroscopy, Ion Exchange, Nanomaterials, Semiconductor, Solar cells, Tissue microarrays

Related Content

ALD Cylinders for Pyrophoric Precursors [VIDEO]

Aldrich Materials Science offers a variety of precursor materials for use in Atomic Layer Deposition, or ALD. ALD uses consecutive, self-limiting reactions to deposit thin films of controlled thickne...
Keywords: Atomic layer deposition, Deposition, Materials Science

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