725544 Aldrich

Tetrakis(ethylmethylamido)hafnium(IV)

packaged for use in deposition systems

DOWNLOAD MSDS (PDF)

Synonym: TEMAH, Tetrakis(ethylmethylamino)hafnium(IV)

Properties

Related Categories 72: Hafnium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis,
form   liquid
bp   78 °C/0.01 mmHg(lit.)
mp   <-50 °C
density   1.324 g/mL at 25 °C(lit.)
storage temp.   2-8°C

Description

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General description

Atomic number of base material: 72 Hafnium

Packaging

10 g in ss cylinder

Protocols & Applications

Precursors Packaged for Depositions Systems

Price and Availability

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