CAS Number 27491-86-7
Linear Formula [(H3C)2CHO]3SiOH
Molecular Weight 222.35
MDL number MFCD09842774
| Related Categories | CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics, Silicon, Vapor Deposition Precursors More... |
| assay | ≥99.999% metals basis |
| density | 0.940 g/mL at 25 °C(lit.) |
Please inquire for quantity, pricing, and packaging options.
Customers Also Viewed
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
Need larger quantities for your development, manufacturing or research applications?