|Related Categories||CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics, Silicon, Vapor Deposition Precursors More...|
|assay||≥99.999% metals basis|
|density||0.940 g/mL at 25 °C(lit.)|
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Certificate of Analysis
|Personal Protective Equipment||Eyeshields, Gloves, half-mask respirator (US), multi-purpose combination respirator cartridge (US)|
|RIDADR||UN 1993 / PGIII|
|Flash Point(F)||170.6 °F|
|Flash Point(C)||77 °C|
Low κ materials address technical challenges of increased chip performance by allowing for the reduction of spacing between metals in multi-level interconnects, interlayer dielectrics and passivation...
Chemfiles Volume 4 Article 3
Keywords: Atomic layer deposition, Chemical vapor deposition, Chromatin immunoprecipitation, Reductions
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