Principles of Chemical Vapor Deposition: What’s Going on Inside the Reactor 

1-4020-1248-9

978-1-4020-1248-8

D.M. Dobkin and M.K. Zuraw, Kluwer Academic Publishers, 2003, 288 pp., hard cover

Acknowledgements. Preface.
1: Introduction.
1. What's behind the facade?
2. Generic reactors and process considerations.
3. Tube and showerhead reactor examples.
2: Reactors without transport.
1. What goes in must go somewhere: Measuring gases.
2. Review: Kinetic theory.
3. The zero-dimensional reactor.
4. Zero-dimensional tube and showerhead examples.
3: Mass transport.
1. Introduction to transport.
2. Convection and diffusion.
3. Diffusion: Physics and math.
4. Fluid flow and convective transport.
5. When flows matter: The Knudsen number.
6. Tube and showerhead examples.
7. On to photons.
4: Heat transport.
1. What is heat (energy) transport?
2. Heat conduction and diffusion.
3. Convective heat transfer made (very) simple.
4. Natural convection. 5. Radiative heat transfer.
6. Temperature measurement.
7. Tube and showerhead examples.
5: Chemistry for CVD.
1. What does the C stand for anyway?
2. Volatility, the V in CVD.
3. Equilibrium: Where things are going.
4. Kinetics: The slowest step wins.
5. Real precursors for real films.
6. Tube reactor example.
7. A few final remarks.
6: Gas discharge plasmas for CVD.
1. Plasma discharges: An instant review.
2. The low-pressure cold-plasma state.
3. Key parameters for capacitive plasma state.
4. Alternative excitation methods.
5. Plasmas for deposition.
6. Plasma damage.
7. Technical details.
8. Ongoing example: Parallel plate reactor.
9. A remark on computational tools.
7: CVD films.
1. Why CVD?
2. Silicon dioxide.
3. Silicon nitride.
4. Tantalum pentoxide.
5. Metal deposition by CVD.
6. Concluding remarks.
8: CVD reactors.
1. CVD reactor configurations.
2. Tube reactors.
3. Showerhead reactors.
4. High density plasma reactors.
5. Injector-based atmospheric pressure reactors.
6. Reactor conclusions. Index.