Product Name or No.
Keyword (Full Text)
MISSION shRNA-RNAi
MISSION siRNA
Molecular Formula
CAS No.
MDL No.
MSDS (Product No. Only)
Supplier X Reference
Substructure
YFG Search
Materials Science Products
New Products for Materials Science
Alternative Energy Materials
Biomaterials
Metal & Ceramic Science
Micro & Nanoelectronics
Nanomaterials
Nanotechnology
Organic Electronics
Polymer Science
Learning Center
Email this page to a friend
To Email:
From Email:
Message:
Product Catalog
>
Materials Science
>
Micro/Nanoelectronics
>
Vapor Deposition Precursors
>
Precursors by Metal
> Aluminum
Aluminum
Scroll Up
Scroll Down
Reset Table
Description
Molecular Formula
Product #
Aluminum tris(2,2,6,6-tetramethyl-3,5-
heptanedionate) 98%
Al(OCC(CH
3
)
3
CHCOC(CH
3
)
3
)
3
397288
Dimethylaluminum isopropoxide 99.99+ % metals basis, ≥95%
(CH
3
)
2
AlOCH(CH
3
)
2
J100047
Triisobutylaluminum
[(CH
3
)
2
CHCH
2
]
3
Al
257206
Trimethylaluminum 97%
(CH
3
)
3
Al
257222
Trimethylaluminum for Cambridge NanoTech Inc. ALD system
(CH
3
)
3
Al
663301
Tris(dimethylamido)
aluminum(III)
Al(N(CH
3
)
2
)
3
469947
Site Use Terms
|
Terms and Conditions of Sale
|
Privacy
|
|
Copyrights © 2008 Sigma-Aldrich Co. All Rights Reserved. Reproduction of any materials from the site is strictly forbidden without permission. Sigma-Aldrich brand products are sold exclusively through Sigma-Aldrich, Inc.
