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Product Catalog Materials Science Micro/Nanoelectronics Vapor Deposition Precursors >  Precursors Packaged for Deposition Systems

Precursors Packaged for Deposition Systems

Modifying materials by coating them with nano-scale ceramic or hybrid layers is a versatile way to add new value, advanced features and unique properties to otherwise conventional materials.1 Creating nano-films on a material’s surface can significantly improve or even completely change its optical, electrical and electronic properties as well as introduce new unique properties such as exceptional hardness or corrosion resistance.2,3

Frequently, the technique of choice for the modification of various surfaces is Atomic Layer Deposition (ALD), which uses consecutive chemical reactions on the material’s surface to create nano-layer or three-dimensional nano-structures.1 Aldrich Materials Science offers high-quality precursors for Atomic Layer Deposition (ALD) packaged in steel cylinders suitable for the Cambridge Nanotech deposition system as well as other deposition tools.

We will continue to expand our portfolio of ALD precursors to include new materials. The most recent list of our products is shown in the table below. For additional vapor deposition precursors prepackaged in cylinders, please contact us by email at matsci@sial.com.

References
1. Material Matters, 2008, v.3, No.2
2. Material Matters, 2006, v.1, No.3
3. ChemFiles, 2004, v.4 No.3


Trimethylaluminum packaged for deposition systems, Cat. No. 663301

 
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Description
Molecular Formula
Form
Product #
Bis(tert-butylimino)bis(dimethylamino)tungsten(VI) for Cambridge Nanotech Inc. ALD systems ((CH3)3CN)2W(N(CH3)2)2 liquid
668885
Bis(ethylcyclopentadienyl)ruthenium(II) for Cambridge NanoTech Inc. ALD system C7H9RuC7H9 liquid
679798
Diethylzinc for Cambridge NanoTech Inc. ALD system (C2H5)2Zn liquid
668729
Silicon tetrachloride for Cambridge NanoTech Inc. ALD system SiCl4 liquid
688509
Tetrakis(dimethylamido)hafnium(IV) for Cambridge NanoTech Inc. ALD system, 99.99+ % [(CH3)2N]4Hf low-melting solid
666610
Tetrakis(dimethylamido)titanium(IV) for Cambridge NanoTech Inc. ALD system, 99.999% trace metals basis [(CH3)2N]4Ti liquid
669008
Tetrakis(dimethylamido)zirconium(IV) for Cambridge NanoTech Inc. ALD system [(CH3)2N]4Zr solid
669016
Titanium(IV) isopropoxide for Cambridge NanoTech Inc. ALD system Ti[OCH(CH3)2]4 liquid
687502
Titanium tetrachloride for Cambridge NanoTech Inc. ALD system, 99.995+ % TiCl4 liquid
697079
Trimethylaluminum for Cambridge NanoTech Inc. ALD system (CH3)3Al liquid
663301
Tris(tert-butoxy)silanol for Cambridge NanoTech Inc. ALD system, 99.999% ((CH3)3CO)3SiOH solid
697281
Tris(diethylamido)(tert-butylimido)tantalum(V) for Cambridge Nanotech Inc. ALD systems (CH3)3CNTa(N(C2H5)2)3 liquid
668990
Tris(tert-pentoxy)silanol for Cambridge NanoTech Inc. ALD system, 99.99+ % (CH3CH2C(CH3)2O)3SiOH liquid
697303