 | Boric acid ACS reagent, ≥99.5% | H3BO3 | B0394 | pricing |
|
 | Chlorosulfonic acid purum, ≥98.0% (T) | HClO3S | 26388 | pricing |
|
 | Chromosulfuric acid ~2% CrO3 basis | | 07404 | pricing |
|
 | Fluorophosphoric acid solution 70 wt. % in H2O | H2FO3P | 324744 | pricing |
|
 | Hexafluorophosphoric acid solution 60% solution based on PF6- only basis, ~65 wt. % in H2O, 70% solution based on hydrolysis products and PF6- basis | HF6P | 200956 | pricing |
|
| Hexafluorophosphoric acid solution technical, ~65% in H2O (gravimetric) | HF6P | 52515 | pricing |
|
 | Hydriodic acid ACS reagent, 55% | HI | 398098 | pricing |
|
 | Hydrobromic acid ACS reagent, 48% | HBr | 438065 | pricing |
|
| Hydrobromic acid purum p.a., ≥48% | HBr | 18730 | pricing |
|
| Hydrobromic acid solution ≥60% | HBr | 02211 | pricing |
|
| Hydrobromic acid solution purum p.a., ≥62% (T) | HBr | 18720 | pricing |
|
| Hydrobromic acid solution purum, ≥33% in acetic acid | HBr | 18735 | pricing |
|
| Hydrobromic acid solution standard, solution (volumetric), 2 M | HBr | 35002 | pricing |
|
 | Hydrochloric acid 37%, AR grade | HCl | 433160 | pricing |
|
| Hydrochloric acid ACS reagent, 37% | HCl | 320331 | pricing |
|
| Hydrochloric acid AR grade, 37% | HCl | 433179 | pricing |
|
| Hydrochloric acid Molecular Biology Grade, 36.5-38.0% | HCl | H1758 | pricing |
|
| Hydrochloric acid Ph Eur, fuming 37% | HCl | 84436 | pricing |
|
| Hydrochloric acid TraceSELECT®, ≥30% (T) | HCl | 08256 | pricing |
|
| Hydrochloric acid puriss., ≥24.5% | HCl | 07104 | pricing |
|
| Hydrochloric acid puriss., ≥31.5% | HCl | 07115 | pricing |
|
| Hydrochloric acid puriss., meets analytical specification of Ph. Eur., BP, NF, fuming, 36.5-38% | HCl | 07102 | pricing |
|
| Hydrochloric acid purum p.a., ≥32% (T) | HCl | 84421 | pricing |
|
| Hydrochloric acid purum p.a., fuming 37%, ≥37% (T) | HCl | 84426 | pricing |
|
| Hydrochloric acid semiconductor grade PURANAL™ (Honeywell 17823), fuming 37% | HCl | 40253 | pricing |
|
| Hydrochloric acid semiconductor grade PURANAL™ (Honeywell 17863) | HCl | 40233 | pricing |
|
| Hydrochloric acid semiconductor grade SLSI PURANAL™ (Honeywell 17302), fuming 37% | HCl | 40332 | pricing |
|
| Hydrochloric acid semiconductor grade VLSI PURANAL™ (Honeywell 17610), fuming 37% | HCl | 40304 | pricing |
|
| Hydrochloric acid solution 0.1 N | HCl | 2104 | pricing |
|
| Hydrochloric acid solution 1.0 N | HCl | H3162 | pricing |
|
| Hydrochloric acid solution 1.0 N, cell culture tested | HCl | H9892 | pricing |
|
| Hydrochloric acid solution 2.0 N | HCl | H3037 | pricing |
|
| Hydrochloric acid solution BioChemika, for HPCE, ~0.1 M HCl | HCl | 84428 | pricing |
|
| Hydrochloric acid solution purum p.a., 24-26% (T) | HCl | 84410 | pricing |
|
| Hydrochloric acid solution ~6 M in H2O, for amino acid analysis | HCl | 84429 | pricing |
|
| Hydrochloric acid standard solution 1.0 N in H2O (1 mol/L) | HCl | 318949 | pricing |
|
| Hydrochloric acid standard solution 2.0 N in H2O (2 mol/L) | HCl | 653799 | pricing |
|
| Hydrochloric acid standard solution solution (volumetric), 0.05 M | HCl | 35320 | pricing |
|
| Hydrochloric acid standard solution solution (volumetric), 1 M in denatured ethanol with toluene | HCl | 35330 | pricing |
|
| Hydrochloric acid standard solution solution (volumetric), 2.0 M | HCl | 35327 | pricing |
|
| Hydrochloric acid standard solution solution (volumetric), 6 M | HCl | 31087 | pricing |
|
 | Hydrofluoric acid 48 wt. % in H2O, purified by double-distillation | HF | 380105 | pricing |
|
| Hydrofluoric acid ACS reagent, 48% | HF | 244279 | pricing |
|
| Hydrofluoric acid ACS reagent, 48% | HF | 695068 | pricing |
|
| Hydrofluoric acid puriss. p.a. plus, ≥49% (acidimetric) | HF | 17076 | pricing |
|
| Hydrofluoric acid puriss., ≥40% | HF | 01010 | pricing |
|
| Hydrofluoric acid purum, ≥40% | HF | 01067 | pricing |
|
| Hydrofluoric acid semiconductor grade MOS PURANAL™ (Honeywell 17928) | HF | 40276 | pricing |
|
| Hydrofluoric acid semiconductor grade PURANAL™ (Honeywell 17735) | HF | 40211 | pricing |
|
| Hydrofluoric acid semiconductor grade PURANAL™ (Honeywell 17736) | HF | 40213 | pricing |
|
| Hydrofluoric acid semiconductor grade SLSI PURANAL™ (Honeywell 17300) | HF | 40319 | pricing |
|
| Hydrofluoric acid semiconductor grade SLSI PURANAL™ (Honeywell 17308) | HF | 40333 | pricing |
|
| Hydrofluoric acid semiconductor grade SLSI PURANAL™ (Honeywell 17312) | HF | 40336 | pricing |
|
| Hydrofluoric acid semiconductor grade ULSI PURANAL™ (Honeywell 17004) | HF | 40312 | pricing |
|
| Hydrofluoric acid semiconductor grade VLSI PURANAL™ (Honeywell 17601) | HF | 40293 | pricing |
|
| Hydrofluoric acid semiconductor grade VLSI PURANAL™ (Honeywell 17602) | HF | 40294 | pricing |
|
| Hydrofluoric acid technical, 40-45% | HF | 01066 | pricing |
|
| Hydrofluoric acid technical, 51-55% | HF | 01068 | pricing |
|
| Hydrofluoric acid technical, 71-75% (T) | HF | 47610 | pricing |
|
| Hydrogen bromide ReagentPlus®, ≥99% | HBr | 295418 | pricing |
|
| Hydrogen chloride ReagentPlus®, ≥99% | HCl | 295426 | pricing |
|
| Hydrogen chloride dioxan solution 4.0 M in dioxane, for protein sequence analysis | HCl | 84431 | pricing |
|
| Hydrogen chloride dioxan solution ~4 M in dioxane | HCl | 40427 | pricing |
|
| Hydrogen chloride solution 3 M in cyclopentyl methyl ether (CPME)  | HCl | 705551 | pricing |
|
 | Iodic acid ACS reagent, ≥99.5% | HIO3 | 221929 | pricing |
|
 | Magic Acid 100% | HF6O3SSb | 175080 | pricing |
|
 | Nitric acid 70%, AR grade | HNO3 | 433233 | pricing |
|
| Nitric acid 70%, purified by double-distillation | HNO3 | 380091 | pricing |
|
| Nitric acid 70%, purified by redistillation, ≥99.999% trace metals basis | HNO3 | 225711 | pricing |
|
| Nitric acid ACS reagent, ≥90% | HNO3 | 695041 | pricing |
|
| Nitric acid ACS reagent, ≥90.0% | HNO3 | 258121 | pricing |
|
| Nitric acid ACS reagent, 70% | HNO3 | 695033 | pricing |
|
| Nitric acid puriss. p.a. plus, ≥65% (T) | HNO3 | 17078 | pricing |
|
| Nitric acid puriss., 64-66% | HNO3 | 07006 | pricing |
|
| Nitric acid purum p.a., ≥65% (T) | HNO3 | 84382 | pricing |
|
| Nitric acid purum p.a., fuming, packed in coated, shock- and leak-protected glass bottle, ≥99.5% (T) | HNO3 | 84392 | pricing |
|
| Nitric acid reagent grade, fuming, >90% | HNO3 | 695025 | pricing |
|
| Nitric acid semiconductor grade MOS PURANAL™ (Honeywell 17920) | HNO3 | 40280 | pricing |
|
| Nitric acid semiconductor grade PURANAL™ (Honeywell 17818) | HNO3 | 40230 | pricing |
|
| Nitric acid semiconductor grade PURANAL™ (Honeywell 17952) | HNO3 | 40222 | pricing |
|
| Nitric acid semiconductor grade VLSI PURANAL™ (Honeywell 17512) | HNO3 | 40303 | pricing |
|
| Nitric acid standard solution solution (volumetric), 0.1 M | HNO3 | 35318 | pricing |
|
| Nitric acid standard solution solution (volumetric), 1 M | HNO3 | 35315 | pricing |
|
 | Nitrosylsulfuric acid solution 40 wt. % in sulfuric acid | HNO5S | 517070 | pricing |
|
 | Phosphoric acid 85 wt. % (solution in water), ACS reagent | H3O4P | 695017 | pricing |
|
| Phosphoric acid ACS reagent, ≥85 wt. % in H2O | H3O4P | 438081 | pricing |
|
| Phosphoric acid TraceSELECT® Ultra, for trace analysis, ≥85% (T) | H3O4P | 64957 | pricing |
|
| Phosphoric acid insect cell culture tested, 85% | H3O4P | P5811 | pricing |
|
| Phosphoric acid puriss., ≥99% | H3O4P | 04102 | pricing |
|
| Phosphoric acid puriss., meets analytical specification of Ph. Eur., BP, NF, FCC, 85.0-88.0% | H3O4P | 04107 | pricing |
|
| Phosphoric acid purum p.a., ≥85% (T) | H3O4P | 79623 | pricing |
|
| Phosphoric acid purum p.a., ≥85% (T) | H3O4P | 06082 | pricing |
|
| Phosphoric acid semiconductor grade MOS PURANAL™ (Honeywell 17938) | H3O4P | 40278 | pricing |
|
| Phosphoric acid semiconductor grade PURANAL™ (Honeywell 17861) | H3O4P | 40266 | pricing |
|
| Phosphoric acid semiconductor grade VLSI PURANAL™ (Honeywell 17644) | H3O4P | 40299 | pricing |
|
| Phosphoric acid semiconductor grade VLSI PURANAL™ (Honeywell 17681), 85% | H3O4P | 40297 | pricing |
|
| Phosphoric acid solution BioChemika, for HPCE, 20 mM phosphoric acid | H3O4P | 79618 | pricing |
|
 | Polyphosphoric acid ≥83% phosphate (as P2O5) basis | | 04101 | pricing |
|
 | Pyrophosphoric acid ≥95% H4P2O7 basis | H4O7P2 | 60352 | pricing |
|
| Pyrophosphoric acid technical grade | H4O7P2 | 433314 | pricing |
|
| Pyrophosphoric acid technical, ≥90% (T) | H4O7P2 | 83210 | pricing |
|
 | Silicic acid hydrate purum p.a., ≥99.0% (calculated on glowed substance), powder | O2Si · xH2O | 60780 | pricing |
|
 | Spermine–Nitric oxide complex hydrate solid | C10H26N6O2 · xH2O | S150 | pricing |
|
 | Sulfamic acid 99.999% trace metals basis | H3NO3S | 481505 | pricing |
|
| Sulfamic acid ACS reagent, 99.3% | H3NO3S | 383120 | pricing |
|
 | Sulfur dioxide solution ACS reagent, ≥6% | H2O3S | 247626 | pricing |
|
 | Sulfuric acid 99.999% | H2O4S | 339741 | pricing |
|
| Sulfuric acid ACS reagent, 95.0-98.0% | H2O4S | 320501 | pricing |
|
| Sulfuric acid purified by double-distillation | H2O4S | 380075 | pricing |
|
| Sulfuric acid puriss., meets analytical specification of Ph. Eur., BP, 95-97% | H2O4S | 07208 | pricing |
|
| Sulfuric acid purum p.a., 95-97% (T) | H2O4S | 84721 | pricing |
|
| Sulfuric acid semiconductor grade PURANAL™ (Honeywell 17831) | H2O4S | 40254 | pricing |
|
| Sulfuric acid semiconductor grade VLSI PURANAL™ (Honeywell 17611) | H2O4S | 40306 | pricing |
|
| Sulfuric acid solution puriss. p.a., for ion chromatography | H2O4S | 93124 | pricing |
|
| Sulfuric acid solution purum p.a., for cream-analysis, 69% | H2O4S | 84723 | pricing |
|
| Sulfuric acid solution purum p.a., for milk-analysis, 91% | H2O4S | 84722 | pricing |
|
| Sulfuric acid solution purum p.a., for textile-analysis, 75% | H2O4S | 84525 | pricing |
|
| Sulfuric acid solution purum p.a., for the det. of fat in cheese, ~62% (T) | H2O4S | 84741 | pricing |
|
| Sulfuric acid solution purum, ~30% in H2O | H2O4S | 84724 | pricing |
|
| Sulfuric acid solution purum, ~72%, for the determination of fluorine | H2O4S | 00647 | pricing |
|
| Sulfuric acid standard solution solution (volumetric), 1 M | H2SO4 | 35276 | pricing |
|
| Sulfuric acid standard solution solution (volumetric), 2.5 M | H2SO4 | 35348 | pricing |
|
| Sulfuric acid standard solution solution (volumetric), 5 M | H2SO4 | 35347 | pricing |
|
 | Tetrafluoroboric acid 49.5-50.5% | HBF4 | 01544 | pricing |
|
 | Tetrafluoroboric acid diethyl ether complex | C4H11BF4O | 400068 | pricing |
|
| Tetrafluoroboric acid diethyl ether complex purum, 51-57% HBF4 in diethyl ether (T) | C4H11BF4O | 15592 | pricing |
|
 | Tetrafluoroboric acid dimethyl ether complex (1:1 mole complex) | C2H7BF4O | 176400 | pricing |
|
| Tetrafluoroboric acid dimethyl ether complex technical, ≥90.0% (T) | C2H7BF4O | 15596 | pricing |
|
| Tetrafluoroboric acid purum, ~50% in H2O (~8.0 M) | HBF4 | 15590 | pricing |
|
| Tetrafluoroboric acid solution 48 wt. % in H2O | HBF4 | 207934 | pricing |
|
| Tetrafluoroboric acid special quality, 31.5-32.5% | HBF4 | 01525 | pricing |
|
| Tetrafluoroboric acid special quality, 49.5-50.5% | HBF4 | 01545 | pricing |
|
 | Trimethylsilyl polyphosphate | | 81345 | pricing |
|
 | Tungstosilicic acid hydrate | H4O40SiW12 · xH2O | T2786 | pricing |
|
| Tungstosilicic acid hydrate ≥99.9% trace metals basis | H4O40SiW12 · xH2O | 383341 | pricing |
|
| Tungstosilicic acid hydrate purum p.a. | H4O40SiW12 · xH2O | 95395 | pricing |
|
 | meta-Phosphoric acid 100%, lumps (glassy) | | 04103 | pricing |
|
| meta-Phosphoric acid ACS reagent, chips, 33.5-36.5% | | 239275 | pricing |
|
| meta-Phosphoric acid purum, ~65% HPO3 basis, pieces | | 79615 | pricing |
|
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