Inorganic Acids

One of the most commonly used product groupings in synthesis are inorganic acids. These products are used in a wide range of applications from serving as feedstock in commercial use to making stock solutions for workup procedures. The Sigma-Aldrich portfolio of inorganic acids spans products with various acidity (pKa values measured in water):
  • Hydrogen Halides (pKa ∼ 3.17, -8.0, -9.0 for HF, HCl, HBr)
  • Boric Acid (pKa ∼ 9.23)
  • Nitric Acid (pKa ∼ -1.3)
  • Phosphoric Acid (pKa ∼ 2.12, 7.21, 12.32)
  • Sulfuric Acid (pKa ∼ -3.0, 1.99)

Since most inorganic acids can be highly corrosive, accidents involving a spill can be catastrophic. However, one of the salient features of some of our products is that Sigma-Aldrich® provides certain inorganic acids in shatter-resistant, high-density polyethylene (HDPE) bottles. This packaging helps to avoid some of the shock from accidentally dropping the bottle and helps to contain the spill. Other advantages to our HDPE bottles are that they are recyclable and can afford some inorganic acids to be shipped in case packs.

Search below for the inorganic acids to fit your research needs.

Product #

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Description

Molecular Formula

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B0394 Boric acid ACS reagent, ≥99.5% H3BO3
31144 Boric acid solution 4%  
26388 Chlorosulfonic acid purum, ≥98.0% (T) HClO3S
324744 Fluorophosphoric acid solution 70 wt. % in H2O H2FO3P
200956 Hexafluorophosphoric acid solution ~65 wt. % in H2O HF6P
398098 Hydriodic acid contains No stabilizer, ACS reagent, 55% HI
18730 Hydrobromic acid purum p.a., ≥48% HBr
438065 Hydrobromic acid ACS reagent, 48% HBr
18720 Hydrobromic acid solution purum p.a., ≥62% (T) HBr
35002 Hydrobromic acid solution volumetric, 2 M HBr (2N) HBr
18735 Hydrobromic acid solution 33 wt. % in acetic acid HBr
H1758 Hydrochloric acid 36.5-38.0%, BioReagent, for molecular biology HCl
320331 Hydrochloric acid ACS reagent, 37% HCl
07104 Hydrochloric acid puriss., 24.5-26.0% HCl
08256 Hydrochloric acid ≥30%, TraceSELECT®, for trace analysis HCl
07115 Hydrochloric acid puriss., ≥31.5% HCl
40233 Hydrochloric acid semiconductor grade PURANAL (Honeywell 17863) HCl
07102 Hydrochloric acid meets analytical specification of Ph. Eur., BP, NF, fuming, 36.5-38% HCl
84426 Hydrochloric acid purum p.a., fuming 37%, ≥37% (T) HCl
84436 Hydrochloric acid Ph Eur, fuming 37% HCl
84421 Hydrochloric acid purum p.a., ≥32% (T) HCl
40332 Hydrochloric acid semiconductor grade SLSI PURANAL (Honeywell 17302), fuming 37% HCl
40304 Hydrochloric acid semiconductor grade VLSI PURANAL (Honeywell 17610), fuming 37% HCl
40253 Hydrochloric acid semiconductor grade PURANAL (Honeywell 17823), fuming 37% HCl
84429 Hydrochloric acid solution ~6 M in H2O, for amino acid analysis HCl
H9892 Hydrochloric acid solution 1.0 N, BioReagent, suitable for cell culture HCl
84428 Hydrochloric acid solution ~0.1 M HCl, for HPCE HCl
84410 Hydrochloric acid solution purum p.a., 24-26% (T) HCl
35320 Hydrochloric acid solution volumetric, 0.05 M HCl (0.05N) HCl
2104 Hydrochloric acid solution volumetric, 0.1 M HCl (0.1N), endotoxin free HCl
318949 Hydrochloric acid solution volumetric, 1.0 M HCl (1.0N) HCl
35327 Hydrochloric acid solution volumetric, 2.0 M HCl (2.0N) HCl
653799 Hydrochloric acid solution volumetric, 2.0 M HCl (2.0N) HCl
31087 Hydrochloric acid solution volumetric, 6 M HCl (6N) HCl
01066 Hydrofluoric acid technical, 40-45% HF
40211 Hydrofluoric acid semiconductor grade PURANAL (Honeywell 17735) HF
40213 Hydrofluoric acid semiconductor grade PURANAL (Honeywell 17736) HF
40276 Hydrofluoric acid semiconductor grade MOS PURANAL (Honeywell 17928) HF
695068 Hydrofluoric acid ACS reagent, 48% HF
295418 Hydrogen bromide ReagentPlus®, ≥99% HBr
295426 Hydrogen chloride ReagentPlus®, ≥99% HCl
705551 Hydrogen chloride solution 3 M in cyclopentyl methyl ether (CPME) HCl
40427 Hydrogen chloride solution 4 M in dioxane HCl
84431 Hydrogen chloride solution 4.0 M in dioxane HCl
221929 Iodic acid ACS reagent, ≥99.5% HIO3
07404   Jone′s reagent ~2% CrO3 basis  
175080 Magic Acid 100% HF6O3SSb
258121 Nitric acid ACS reagent, ≥90.0% HNO3
225711 Nitric acid 70%, purified by redistillation, ≥99.999% trace metals basis HNO3
84392 Nitric acid purum p.a., fuming, packed in coated, shock- and leak-protected glass bottle, ≥99% (T) HNO3
40230 Nitric acid semiconductor grade PURANAL (Honeywell 17818) HNO3
40222 Nitric acid semiconductor grade PURANAL (Honeywell 17952) HNO3
40280 Nitric acid semiconductor grade MOS PURANAL (Honeywell 17920) HNO3
40303 Nitric acid semiconductor grade VLSI PURANAL (Honeywell 17512) HNO3
695025 Nitric acid reagent grade, fuming, >90% HNO3
695041 Nitric acid ACS reagent, ≥90.0% HNO3
695033 Nitric acid ACS reagent, 70% HNO3
35318 Nitric acid solution volumetric, 0.1 M HNO3 (0.1N) HNO3
35315 Nitric acid solution volumetric, 1 M HNO3 (1N) HNO3
517070 Nitrosylsulfuric acid solution 40 wt. % in sulfuric acid HNO5S
P5811 Phosphoric acid BioReagent, suitable for insect cell culture, 85% H3O4P
64957 Phosphoric acid ≥85%, TraceSELECT® Ultra, for ultratrace analysis H3O4P
438081 Phosphoric acid ACS reagent, ≥85 wt. % in H2O H3O4P
04102 Phosphoric acid puriss., ≥99% H3O4P
04107 Phosphoric acid puriss., meets analytical specification of Ph. Eur., BP, NF, FCC, 85.0-88.0% H3O4P
79623 Phosphoric acid purum p.a., ≥85% (T) H3O4P
40278 Phosphoric acid semiconductor grade MOS PURANAL (Honeywell 17938) H3O4P
40266 Phosphoric acid semiconductor grade PURANAL (Honeywell 17861) H3O4P
40297 Phosphoric acid semiconductor grade VLSI PURANAL (Honeywell 17681), 85% H3O4P
695017 Phosphoric acid ACS reagent, ≥85 wt. % in H2O H3O4P
04103 meta-Phosphoric acid 100%, lumps (glassy)  
79615 meta-Phosphoric acid purum, ~65% HPO3 basis, pieces  
239275 meta-Phosphoric acid ACS reagent, chips, 33.5-36.5%  
04101 Polyphosphoric acid ≥83% phosphate (as P2O5) basis  
433314 Pyrophosphoric acid technical grade H4O7P2
83210 Pyrophosphoric acid technical, ≥90% (T) H4O7P2
211176 Selenous acid 98% H2O3Se
60780 Silicic acid hydrate purum p.a., ≥99.0%, powder O2Si · xH2O
708348 Silicomolybdic acid solution  
S150 Spermine–Nitric oxide complex hydrate source of nitric oxide C10H26N6O2 · xH2O
481505 Sulfamic acid 99.999% trace metals basis H3NO3S
383120 Sulfamic acid ACS reagent, 99.3% H3NO3S
247626 Sulfur dioxide solution ACS reagent, ≥6% H2O3S
339741 Sulfuric acid 99.999% H2O4S
320501 Sulfuric acid ACS reagent, 95.0-98.0% H2O4S
07208 Sulfuric acid puriss., meets analytical specification of Ph. Eur., BP, 95-97% H2O4S
84721 Sulfuric acid purum p.a., 95-97% (T) H2O4S
40306 Sulfuric acid semiconductor grade VLSI PURANAL (Honeywell 17611) H2O4S
40254 Sulfuric acid semiconductor grade PURANAL (Honeywell 17831) H2O4S
93124 Sulfuric acid solution 0.25 M in H2O, for ion chromatography H2O4S
84722 Sulfuric acid solution purum p.a., for milk-analysis, 91% H2O4S
84525 Sulfuric acid solution purum p.a., for textile-analysis, 75% H2O4S
00647 Sulfuric acid solution for the determination of fluorine, for textile and cream analysis, 72% H2O4S
84723 Sulfuric acid solution purum p.a., for cream-analysis, 69% H2O4S
84741 Sulfuric acid solution purum p.a., for the det. of fat in cheese, ~62% (T) H2O4S
84724 Sulfuric acid solution purum, ~30% in H2O H2O4S
28-5930 Sulfuric acid solution 1 M H2O4S
35276 Sulfuric acid solution volumetric, 1 M H2SO4 (2N) H2O4S
35348 Sulfuric acid solution volumetric, 2.5 M H2SO4 (5N) H2O4S
35347 Sulfuric acid solution volumetric, 5 M H2SO4 (10N) H2O4S
207934 Tetrafluoroboric acid solution 48 wt. % in H2O HBF4
400068 Tetrafluoroboric acid diethyl ether complex C4H11BF4O
176400 Tetrafluoroboric acid dimethyl ether complex (1:1 mole complex) C2H7BF4O
81345 Trimethylsilyl polyphosphate  
383341 Tungstosilicic acid hydrate ≥99.9% trace metals basis H4O40SiW12 · xH2O
T2786 Tungstosilicic acid hydrate H4O40SiW12 · xH2O
95395 Tungstosilicic acid hydrate purum p.a. H4O40SiW12 · xH2O