One of the most commonly used product groupings in synthesis are inorganic acids. These products are used in a wide range of applications from serving as feedstock in commercial use to making stock solutions for workup procedures. The Sigma-Aldrich portfolio of inorganic acids spans products with various acidity (pKa values measured in water):
Hydrogen Halides (pKa ∼ 3.17, -8.0, -9.0 for HF, HCl, HBr) Boric Acid (pKa ∼ 9.23) Nitric Acid (pKa ∼ -1.3) Phosphoric Acid (pKa ∼ 2.12, 7.21, 12.32) Sulfuric Acid (pKa ∼ -3.0, 1.99) Since most inorganic acids can be highly corrosive, accidents involving a spill can be catastrophic. However, one of the salient features of some of our products is that Sigma-Aldrich
® provides certain inorganic acids in shatter-resistant, high-density polyethylene (HDPE) bottles. This packaging helps to avoid some of the shock from accidentally dropping the bottle and helps to contain the spill. Other advantages to our HDPE bottles are that they are recyclable and can afford some inorganic acids to be shipped in case packs.
Search below for the inorganic acids to fit your research needs.
Product #
Image
Description
Molecular Formula
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B0394
Boric acid ACS reagent, ≥99.5%
H3 BO3
31144
Boric acid solution 4%
26388
Chlorosulfonic acid purum, ≥98.0% (T)
HClO3 S
324744
Fluorophosphoric acid solution 70 wt. % in H2 O
H2 FO3 P
200956
Hexafluorophosphoric acid solution ~65 wt. % in H2 O
HF6 P
398098
Hydriodic acid contains No stabilizer, ACS reagent, 55%
HI
18730
Hydrobromic acid purum p.a., ≥48%
HBr
438065
Hydrobromic acid ACS reagent, 48%
HBr
18720
Hydrobromic acid solution purum p.a., ≥62% (T)
HBr
35002
Hydrobromic acid solution volumetric, 2 M HBr (2N)
HBr
18735
Hydrobromic acid solution 33 wt. % in acetic acid
HBr
H1758
Hydrochloric acid 36.5-38.0%, BioReagent, for molecular biology
HCl
320331
Hydrochloric acid ACS reagent, 37%
HCl
07104
Hydrochloric acid puriss., 24.5-26.0%
HCl
08256
Hydrochloric acid ≥30%, Trace SELECT® , for trace analysis
HCl
07115
Hydrochloric acid puriss., ≥31.5%
HCl
40233
Hydrochloric acid semiconductor grade PURANAL™ (Honeywell 17863)
HCl
07102
Hydrochloric acid meets analytical specification of Ph. Eur., BP, NF, fuming, 36.5-38%
HCl
84426
Hydrochloric acid purum p.a., fuming 37%, ≥37% (T)
HCl
84436
Hydrochloric acid Ph Eur, fuming 37%
HCl
84421
Hydrochloric acid purum p.a., ≥32% (T)
HCl
40332
Hydrochloric acid semiconductor grade SLSI PURANAL™ (Honeywell 17302), fuming 37%
HCl
40304
Hydrochloric acid semiconductor grade VLSI PURANAL™ (Honeywell 17610), fuming 37%
HCl
40253
Hydrochloric acid semiconductor grade PURANAL™ (Honeywell 17823), fuming 37%
HCl
84429
Hydrochloric acid solution ~6 M in H2 O, for amino acid analysis
HCl
H9892
Hydrochloric acid solution 1.0 N, BioReagent, suitable for cell culture
HCl
84428
Hydrochloric acid solution ~0.1 M HCl, for HPCE
HCl
84410
Hydrochloric acid solution purum p.a., 24-26% (T)
HCl
35320
Hydrochloric acid solution volumetric, 0.05 M HCl (0.05N)
HCl
2104
Hydrochloric acid solution volumetric, 0.1 M HCl (0.1N), endotoxin free
HCl
318949
Hydrochloric acid solution volumetric, 1.0 M HCl (1.0N)
HCl
35327
Hydrochloric acid solution volumetric, 2.0 M HCl (2.0N)
HCl
653799
Hydrochloric acid solution volumetric, 2.0 M HCl (2.0N)
HCl
31087
Hydrochloric acid solution volumetric, 6 M HCl (6N)
HCl
01066
Hydrofluoric acid technical, 40-45%
HF
40211
Hydrofluoric acid semiconductor grade PURANAL™ (Honeywell 17735)
HF
40213
Hydrofluoric acid semiconductor grade PURANAL™ (Honeywell 17736)
HF
40276
Hydrofluoric acid semiconductor grade MOS PURANAL™ (Honeywell 17928)
HF
695068
Hydrofluoric acid ACS reagent, 48%
HF
295418
Hydrogen bromide ReagentPlus ® , ≥99%
HBr
295426
Hydrogen chloride ReagentPlus ® , ≥99%
HCl
705551
Hydrogen chloride solution 3 M in cyclopentyl methyl ether (CPME)
HCl
40427
Hydrogen chloride solution 4 M in dioxane
HCl
84431
Hydrogen chloride solution 4.0 M in dioxane
HCl
221929
Iodic acid ACS reagent, ≥99.5%
HIO3
07404
Jone′s reagent ~2% CrO3 basis
175080
Magic Acid 100%
HF6 O3 SSb
258121
Nitric acid ACS reagent, ≥90.0%
HNO3
225711
Nitric acid 70%, purified by redistillation, ≥99.999% trace metals basis
HNO3
84392
Nitric acid purum p.a., fuming, packed in coated, shock- and leak-protected glass bottle, ≥99% (T)
HNO3
40230
Nitric acid semiconductor grade PURANAL™ (Honeywell 17818)
HNO3
40222
Nitric acid semiconductor grade PURANAL™ (Honeywell 17952)
HNO3
40280
Nitric acid semiconductor grade MOS PURANAL™ (Honeywell 17920)
HNO3
40303
Nitric acid semiconductor grade VLSI PURANAL™ (Honeywell 17512)
HNO3
695025
Nitric acid reagent grade, fuming, >90%
HNO3
695041
Nitric acid ACS reagent, ≥90.0%
HNO3
695033
Nitric acid ACS reagent, 70%
HNO3
35318
Nitric acid solution volumetric, 0.1 M HNO3 (0.1N)
HNO3
35315
Nitric acid solution volumetric, 1 M HNO3 (1N)
HNO3
517070
Nitrosylsulfuric acid solution 40 wt. % in sulfuric acid
HNO5 S
P5811
Phosphoric acid BioReagent, suitable for insect cell culture, 85%
H3 O4 P
64957
Phosphoric acid ≥85%, Trace SELECT® Ultra, for ultratrace analysis
H3 O4 P
438081
Phosphoric acid ACS reagent, ≥85 wt. % in H2 O
H3 O4 P
04102
Phosphoric acid puriss., ≥99%
H3 O4 P
04107
Phosphoric acid puriss., meets analytical specification of Ph. Eur., BP, NF, FCC, 85.0-88.0%
H3 O4 P
79623
Phosphoric acid purum p.a., ≥85% (T)
H3 O4 P
40278
Phosphoric acid semiconductor grade MOS PURANAL™ (Honeywell 17938)
H3 O4 P
40266
Phosphoric acid semiconductor grade PURANAL™ (Honeywell 17861)
H3 O4 P
40297
Phosphoric acid semiconductor grade VLSI PURANAL™ (Honeywell 17681), 85%
H3 O4 P
695017
Phosphoric acid ACS reagent, ≥85 wt. % in H2 O
H3 O4 P
04103
meta-Phosphoric acid 100%, lumps (glassy)
79615
meta-Phosphoric acid purum, ~65% HPO3 basis, pieces
239275
meta-Phosphoric acid ACS reagent, chips, 33.5-36.5%
04101
Polyphosphoric acid ≥83% phosphate (as P2 O5 ) basis
433314
Pyrophosphoric acid technical grade
H4 O7 P2
83210
Pyrophosphoric acid technical, ≥90% (T)
H4 O7 P2
211176
Selenous acid 98%
H2 O3 Se
60780
Silicic acid hydrate purum p.a., ≥99.0%, powder
O2 Si · xH2 O
708348
Silicomolybdic acid solution
S150
Spermine–Nitric oxide complex hydrate source of nitric oxide
C10 H26 N6 O2 · xH2 O
481505
Sulfamic acid 99.999% trace metals basis
H3 NO3 S
383120
Sulfamic acid ACS reagent, 99.3%
H3 NO3 S
247626
Sulfur dioxide solution ACS reagent, ≥6%
H2 O3 S
339741
Sulfuric acid 99.999%
H2 O4 S
320501
Sulfuric acid ACS reagent, 95.0-98.0%
H2 O4 S
07208
Sulfuric acid puriss., meets analytical specification of Ph. Eur., BP, 95-97%
H2 O4 S
84721
Sulfuric acid purum p.a., 95-97% (T)
H2 O4 S
40306
Sulfuric acid semiconductor grade VLSI PURANAL™ (Honeywell 17611)
H2 O4 S
40254
Sulfuric acid semiconductor grade PURANAL™ (Honeywell 17831)
H2 O4 S
93124
Sulfuric acid solution 0.25 M in H2 O, for ion chromatography
H2 O4 S
84722
Sulfuric acid solution purum p.a., for milk-analysis, 91%
H2 O4 S
84525
Sulfuric acid solution purum p.a., for textile-analysis, 75%
H2 O4 S
00647
Sulfuric acid solution for the determination of fluorine, for textile and cream analysis, 72%
H2 O4 S
84723
Sulfuric acid solution purum p.a., for cream-analysis, 69%
H2 O4 S
84741
Sulfuric acid solution purum p.a., for the det. of fat in cheese, ~62% (T)
H2 O4 S
84724
Sulfuric acid solution purum, ~30% in H2 O
H2 O4 S
28-5930
Sulfuric acid solution 1 M
H2 O4 S
35276
Sulfuric acid solution volumetric, 1 M H2 SO4 (2N)
H2 O4 S
35348
Sulfuric acid solution volumetric, 2.5 M H2 SO4 (5N)
H2 O4 S
35347
Sulfuric acid solution volumetric, 5 M H2 SO4 (10N)
H2 O4 S
207934
Tetrafluoroboric acid solution 48 wt. % in H2 O
HBF4
400068
Tetrafluoroboric acid diethyl ether complex
C4 H11 BF4 O
176400
Tetrafluoroboric acid dimethyl ether complex (1:1 mole complex)
C2 H7 BF4 O
81345
Trimethylsilyl polyphosphate
383341
Tungstosilicic acid hydrate ≥99.9% trace metals basis
H4 O40 SiW12 · xH2 O
T2786
Tungstosilicic acid hydrate
H4 O40 SiW12 · xH2 O
95395
Tungstosilicic acid hydrate purum p.a.
H4 O40 SiW12 · xH2 O