Multi-Walled Carbon Nanotubes

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755117 Carbon nanotube, multi-walled thin and short, <5% Metal Oxide(TGA)   Catalytic Carbon Vapor Deposition (CCVD) Method
755133 Carbon nanotube, multi-walled thin, <5% Metal Oxide(TGA)   Catalytic Carbon Vapor Deposition (CCVD) Method
755125 Carbon nanotube, multi-walled, carboxylic acid functionalized thin, extent of labeling: >8% carboxylic acid functionalized, avg. diam. × L 9.5 nm × 1.5 μm >80% carbon basis
Catalytic Carbon Vapor Deposition (CCVD) Method
659258 Carbon nanotube, multi-walled >90% carbon basis, D × L 110-170 nm × 5-9 μm Green Alternative >90% carbon basis
Chemical Vapor Deposition (CVD) Method
698849 Carbon nanotube, multi-walled >98% carbon basis, O.D. × L 6-13 nm × 2.5-20 μm Green Alternative >98% carbon basis
Chemical Vapor Deposition (CVD) Method
724769 Carbon nanotube, multi-walled O.D. × L 6-9 nm × 5 μm, >95% (carbon) Green Alternative >95% (carbon)
CoMoCAT Catalytic Chemical Vapor Deposition (CVD) Method
773840 Carbon nanotube, multi-walled ≥98% carbon basis, O.D. × I.D. × L 10 nm ± 1 nm × 4.5 nm ± 0.5 nm × 3-~6 μm, TEM Green Alternative ≥98% carbon basis
CoMoCAT Catalytic Chemical Vapor Deposition (CVD) Method
900788 Carbon nanotube, few-walled carbon ≥95 %, D × L 2.5-3 nm × 2-6 μm New ≥94% (carbon as CNT by TGA)
CoMoCAT synthesis process
412988 Carbon nanotube, multi-walled as-produced cathode deposit, >7.5% MWCNT basis, O.D. × L 7-15 nm × 0.5-10 μm Green Alternative >7.5% MWCNT basis
Electric Arc Discharge Method
406074 Carbon nanotube, multi-walled powdered cylinder cores, 20-30% MWCNT basis, O.D. × L 7-12 nm × 0.5-10 μm Green Alternative 20-30% MWCNT basis
Electric Arc Discharge Method
687804 Carbon nanotube array, multi-walled vertically aligned on silicon wafer substrate >95 atom % carbon basis (x-ray)
Plasma-Enhanced Chemical Vapor Deposition (PECVD) Method
687812 Carbon nanotube array, multi-walled vertically aligned on copper wafer substrate >99.9% carbon basis
Plasma-Enhanced Chemical Vapor Deposition (PECVD) Method