Sputtering Targets

Product #

Description

Formula

Diam. x Thickness

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749036 Aluminum sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.9995% trace metals basis Al 99.9995 3.00 in. × 0.125 in.
752665 Aluminum zinc oxide sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.99% trace metals basis Al2O3/ZnO 99.99 3.00 in. × 0.125 in.
749052 Chromium sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.95% trace metals basis Cr 99.95 3.00 in. × 0.125 in.
767476 Copper sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis Cu 99.95 2.00 in. × 0.25 in.
752673 Gallium zinc oxide sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.99% trace metals basis ZnO/Ga2O3 99.99 3.00 in. × 0.125 in.
752649 Indium oxide sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.99% trace metals basis In2O3 99.99 3.00 in. × 0.125 in.
752657 Indium tin oxide sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.99% trace metals basis   99.99 3.00 in. × 0.125 in.
752703 Indium zinc oxide sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.99% trace metals basis In2O3/ZnO 99.99 3.00 in. × 0.125 in.
767484 Nickel sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis Ni 99.95 2.00 in. × 0.25 in.
767492 Silicon sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.999% trace metals basis Si 99.999 2.00 in. × 0.25 in.
767514 Tantalum sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis Ta 99.95 2.00 in. × 0.25 in.
749044 Titanium sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis Ti 99.995 3.00 in. × 0.125 in.
767506 Titanium sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis Ti 99.995 2.00 in. × 0.25 in.
767522 Tungsten sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis W 99.95 2.00 in. × 0.25 in.
774022 Yttrium(III) oxide sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.99% trace metals basis Y2O3 99.99 2.00 in. × 0.25 in.
773972 Yttrium sputtering target diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis Y 99.9 2.00 in. × 0.25 in.
749060 Zinc sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis Zn 99.995 3.00 in. × 0.125 in.
752681 Zinc oxide sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.99% trace metals basis ZnO 99.99 3.00 in. × 0.125 in.
774030 Zirconium(IV) oxide sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis (excludes 2% HfO2) ZrO2 99.95 2.00 in. × 0.25 in.
774049 Zirconium(IV) oxide-yttria stabilized sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis ZrO2 · Y2O3 99.9 2.00 in. × 0.25 in.
774057 Zirconium yttrium alloy sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis (excluding <=1% Hf) Zr.85Y.15 99.9 2.00 in. × 0.25 in.