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Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers

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474428 2,2,3,3,4,4,5,5,6,6,7,7-Dodecafluoroheptyl acrylate 95% C10H6F12O2
E1101 Epifluorohydrin 98% C3H5FO
474169 Glycidyl 2,2,3,3,4,4,5,5-octafluoropentyl ether 96% C8H8F8O2
474150 Glycidyl 2,2,3,3-tetrafluoropropyl ether 97% C6H8F4O2
474355 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Heneicosafluorododecyl acrylate 96% C15H7F21O2
474223 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-Heptadecafluorodecyl methacrylate contains MEHQ as inhibitor, 97% C14H9F17O2
474088 (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-Heptadecafluorononyl)oxirane 96% C11H5F17O
443751 2,2,3,3,4,4,4-Heptafluorobutyl acrylate 97% C7H5F7O2
444006 2,2,3,3,4,4,4-Heptafluorobutyl methacrylate 97% C8H7F7O2
474452 2,2,3,4,4,4-Hexafluorobutyl acrylate 95% C7H6F6O2
371971 2,2,3,4,4,4-Hexafluorobutyl methacrylate 98% C8H8F6O2
367656 1,1,1,3,3,3-Hexafluoroisopropyl acrylate 99% C6H4F6O2
367664 1,1,1,3,3,3-Hexafluoroisopropyl methacrylate 99% C7H6F6O2
474401 2,2,3,3,4,4,5,5-Octafluoropentyl acrylate 97%, contains 100 ppm monomethyl ether hydroquinone as inhibitor C8H6F8O2
470988 2,2,3,3,4,4,5,5-Octafluoropentyl methacrylate contains 100 ppm MEHQ as inhibitor, 98% C9H8F8O2
470961 2,2,3,3,3-Pentafluoropropyl acrylate 98%, contains 100 ppm 4-tert-butylcatechol as inhibitor C6H5F5O2
474487 1H,1H,2H,2H-Perfluorodecyl acrylate contains 100 ppm tert-butylcatechol as inhibitor, 97% C13H7F17O2
408271 Tetrahydrofurfuryl acrylate contains 500 ppm monomethyl ether hydroquinone as inhibitor, 500 ppm hydroquinone as inhibitor C8H12O3
474347 3,3,4,4,5,5,6,6,7,7,8,8,8-Tridecafluorooctyl acrylate contains inhibitor, 97% C11H7F13O2
297720 2,2,2-Trifluoroethyl acrylate contains 100 ppm MEHQ as inhibitor, 99% C5H5F3O2
369144 2-(Trifluoromethyl)acrylic acid 98% C4H3F3O2