Aldrich Materials Science

Micro & Nanoeletronics product offerings

See below a selection of new and exclusive products, which are in relation to the
following issues of our FREE ACCESS technical periodical Material Matters™:

- Vol. 7, No. 2: "Functional Inorganic Materials: From Precursors to Applications"
- Vol. 5, No. 2: "Nanomaterials for Energy and Electronics"
- Vol. 3, No. 2: "Nanoscale Surface Modifications"


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Hard materials
Product No. Description Linear Formula Purity Physical Form Add to Cart
Solution Deposition Precursors
541869-5G NEW  Dichlorobis(2,2,6,6-tetramethyl-3,5-heptanedionato)titanium(IV) (OCC(CH3)3CHCOC(CH3)3)2TiCl2  97% powder
   
541869-25G NEW  Dichlorobis(2,2,6,6-tetramethyl-3,5-heptanedionato)titanium(IV) (OCC(CH3)3CHCOC(CH3)3)2TiCl2  97% powder
   
667943-5G NEW  Hafnium(IV) n-butoxide C16H36HfO4  99% (purity excludes ~1% Zr) liquid
   
667943-25G NEW  Hafnium(IV) n-butoxide C16H36HfO4  99% (purity excludes ~1% Zr) liquid
   
282782-500MG Platinum(II) acetylacetonate Pt(C5H7O2)2  97% solid
   
282782-5G Platinum(II) acetylacetonate Pt(C5H7O2)2  97% solid
   
328650-500ML Potassium tert-butoxide solution, 1.0 M in THF (CH3)3COK  - liquid
   
328650-50ML Potassium tert-butoxide solution, 1.0 M in THF (CH3)3COK  - liquid
   
282774-1G Rhodium(III) acetylacetonate [CH3COCH=C(O-)CH3]3Rh  97% solid
   
282774-5G Rhodium(III) acetylacetonate [CH3COCH=C(O-)CH3]3Rh  97% solid
   
131903-1L Tetraethyl orthosilicate, reagent grade Si(OC2H5)4  98% liquid
   
131903-5L Tetraethyl orthosilicate, reagent grade Si(OC2H5)4  98% liquid
   
679259-50G NEW Tetramethyl orthosilicate, deposition grade Si(OCH3)4  ≥98% liquid
   
333948-2L Zirconium(IV) butoxide solution, 80 wt. % in 1-butanol Zr(OC4H9)4  - solution
   
333972-500ML Zirconium(IV) propoxide solution, 70 wt. % in 1-propanol Zr(OCH2CH2CH3)4  - solution
   
Vapor Deposition Precursors
Chemical Vapor Deposition
741442-100ML NEW (3-Aminopropyl)triethoxysilane H2N(CH2)3Si(OC2H5)3  ≥98.0%  liquid 
   
741442-500ML NEW (3-Aminopropyl)triethoxysilane H2N(CH2)3Si(OC2H5)3  ≥98.0%  liquid 
   
262455-1G Bis(cyclopentadienyl)ruthenium(II) C10H10Ru  97% solid 
   
754943-25G NEW Molybdenumhexacarbonyl, packaged for use in deposition systems Mo(CO)6  99.9% trace metals basis  solid 
   
577766-5G Molybdenumhexacarbonyl, ≥99.9% trace metals basis Mo(CO)6  ≥99.9% trace metals basis  solid 
   
759414-25ML NEW Tetraethyl orthosilicate, packaged for use in deposition systems Si(OC2H5)4  -  liquid 
   
663301-25G Trimethylaluminum, packaged for use in deposition systems (CH3)3Al  -  liquid 
   
645605-2G Trimethyl(methylcyclopentadienyl)platinum(IV) C5H4CH3Pt(CH3)3  98% low-melting solid 
   
442593-5G-A Tris(pentafluorophenyl)borane (C6F5)3B  95% solid 
   
Physical Vapor Deposition
749036-1EA NEW Aluminum, sputtering target, diam. 3.00 in. × thickness 0.125 in. Al  99.9995% trace metals basis  circular target 
   
749052-1EA NEW Chromium, sputtering target, diam. 3.00 in. × thickness 0.125 in. Cr  99.95% trace metals basis  circular target 
   
752657-1EA NEW Indium tin oxide, sputtering target, diam. 3.00 in. × thickness 0.125 in. InO/SnO  99.99% trace metals basis  circular target 
   
449229-7.6G Iridium, evaporation slug, diam. 0.6 cm × L 1.2 cm Ir  99.9% trace metals basis  evaporation slug 
   
357588-2.2G Nickel, foil, thickness 0.1 mm Ni  99.98% trace metals basis  foil 
   
357588-8.8G Nickel, foil, thickness 0.1 mm Ni  99.98% trace metals basis  foil 
   
357243-8.4G Tantalum, foil, thickness 0.05 mm Ta  ≥99.9% trace metals basis  foil 
   
357243-18.9G Tantalum, foil, thickness 0.05 mm Ta  ≥99.9% trace metals basis  foil 
   
433667-4.8G Titanium, evaporation slug, diam. 6.3 mm × L 6.3 mm Ti  ≥99.99% trace metals basis  evaporation slug 
   
419141-4.6G Zirconium, foil, thickness 0.1 mm Zr  99.98% trace metals basis  foil 
   
Electronic Chemicals
733466-1L NEW Acetonitrile, electronic grade CH3CN  99.999% trace metals basis  liquid 
   
740969-1G NEW Barium tetrafluorocobaltate BaCoF4  99.9% trace metals basis  powder 
   
442305-1L Bis(ethylenediamine)copper(II) hydroxide solution, 1.0 M in H2O Cu(H2NCH2CH2NH2)2(OH)2  -  solution 
   
B1252-500ML Boron trifluoride-methanol solution, 14% in methanol BF3 · MeOH  -  solution 
   
B1252-1L Boron trifluoride-methanol solution, 14% in methanol BF3 · MeOH  -  solution 
   
751480-5G NEW Malonic acid, sublimed grade CH2(COOH)2  ≥99.95% trace metals basis  powder 
   
733458-1L NEW 2-Propanol, electronic grade (CH3)2CHOH  99.999% trace metals basis  liquid 
   
229857-50G Selenous acid H2SeO3  99.999% trace metals basis  solid 
   
229857-100G Selenous acid H2SeO3  99.999% trace metals basis  solid 
   
308463-25G Telluric acid H6TeO6  98% solid 
   
308463-100G Telluric acid H6TeO6  98% solid 
   
735930-25G NEW Zinc fluoride, anhydrous ZnF2  99.999% trace metals basis  powder 
   
Quasicrystals
757934-10G NEW AlCuFe quasicrystal Al65Cu23Fe12  ≥99.9% trace metals  powder/<10μm 
   
757942-10G NEW AlCuFe quasicrystal Al65Cu23Fe12  ≥99.9% trace metals  powder/55-75μm 
   
757950-10G NEW AlCuFeCr quasicrystal Al70Cu10Fe10Cr10  ≥99.9% trace metals  powder/10-25μm 
   
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