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Micro and Nanoelectronics

Deposition Grade Silanes for Sol-Gel Process Applications

Sol-gel processing is beneficial in the formation of ceramic and glass films for a number of reasons.1-4 It is a simple process that does not require exotic materials, catalysts or expensive deposition equipment. Sol-gel reactions do not employ extreme reaction conditions and the properties of the materials prepared using sol-gel approaches are easy to modify by utilizing an organically modified precursors.2,3

Deposition Grade Silanes comprise alkoxysilanes and their predecessors chlorosilanes typically used in a Sol-Gel process. Transformations of alkoxysilanes during the processing proceed through a series of subsiquent hydrolysis, condensation and thermal treatment steps briefly outlined in Figure 1.

Figure 1

 

Applications of Deposition Grade Silanes include but are not limited to

  • film coatings on glass and other appropriate surfaces1,4
  • reinforcement of polymeric structures1, such as polyesters,16 Nafion®,17 Surlyn®
  • hermetic barriers for electronics and electrochemical devices5
  • and others applications where Si-O-based chain assemblies are desirable.3,4

 

Extensive analytical data available for Deposition Grade Silanes allow for a better understanding of chemical composition and properties of the materials created using these precursors as compared to those prepared form conventional silanes available commercially.

Purity of our Deposition Grade Silanes exceed 98%. They are fully characterized by chemical analysis and nuclear magnetic resonance (NMR). The impurities present in these materials are detected using a gas-chromatography (GC) and/or a GC-MS technique and reported on the Certificate of Analysis (CA). In addition, trace metals impurities are also reported on the CA.

 

Product Information


Product # Product Name/Description Structure Add to Cart
679267 Allytrimethoxysilane
679224 Butyltrichlorosilane

679356

[3-(Diethylamino)propyl]trimethoxysilane

679216 Ethyltrichlorosilane
679364 Isobutyl(trimethoxy)silane
679208 Methyltrichlorosilane

679321

N-Propyltriethoxysilane
679194 Pentyltrichlorosilane
679259 Tetramethyl orthosilicate
679240 Tetrapropyl orthosilicate
679305 Triethoxy(octyl)silane
679291 Triethoxyphenylsilane
679275 Triethoxyvinylsilane
679232 Trimethoxymethylsilane
679313 Trimethoxyphenylsilane

 

References:

  1. S.K.Young, Material Matters, 2006, Vol 1., No.3, 8.
  2. F. Caruso, Colloids and Colloid Assemblies: Synthesis, Modification, Organization, and Utilization of Colloid Particles, 2004, John Wiley & Sons, New York.
  3. Sol-Gel Technology for Thin Films, Fibers, Preforms, Electronics, and Specialty Shapes, L.C. Klein, Ed., 1988, Noyes Publ., Park Ridge, NJ.
  4. A.C.Pierre, Introduction to Sol-Gel Processing, 2002 Kulwer, Academic Publishers, Boston, Dodrecht, London.
  5. A. B. Wojcik, L. C. Klein, J. Sol-Gel Science and Technology, 1995,4, 57.