|
|
Micro & Nanoelectronics
Substrates
|
|
|
| Gold Coated Substrates (Au 99.999%) |
| Substrate Type |
Au Surface Thickness (Å) |
Adhesion Layer |
Dimensions |
Catalog # |
| Microsope slide1 |
100 |
Titanium (99.9%) |
1" X 3 " |
643203 |
| Microsope slide1 |
1000 |
Titanium (99.9%) |
1" X 3 " |
643246 |
| Glass cover slip1 |
100 |
Titanium (99.9%) |
22 mm X 22 mm |
643254 |
| Glass cover slip1 |
100 |
Titanium (99.9%) |
15 mm diam. |
643289 |
| Mica slide |
2000 |
- |
1" X 1.5" |
643270 |
| Mica slide |
2000 |
- |
1" X 3 " |
643297 |
| Silicon wafer |
1000 |
- |
4" diameter |
643262 |
| 1Soda-lime glass |
| Single Crystal Substrates |
| Composition |
Formula |
Orientation |
Crystal Type |
Unit Cell (Å) |
Melting Point(°C) |
Density (g/cm3) |
Hardness (Moh) |
Product # |
| Aluminum oxide single crystal substrate 99.99 % |
Al2O3 |
(0001) |
Hexagonal |
a = 4.758, c = 12.992 |
2040 |
3.98 |
9 |
634875 |
| Lanthanum aluminum oxide single crystal substrate |
LaAlO3 |
<100> |
Rhombohedral < 435 °C
Cubic > 435 °C
|
a = 5.357, c = 13.22
a = 3.821 |
2080
2080
|
6.52
6.52
|
5.9
5.9
|
634735 |
| LSAT* 99.9+ % single crystal substrate |
(LaAlO3)0.3(Sr2AlTaO6)0.7 |
<100> |
Cubic |
a = 3.868 |
1840 |
6.74 |
6.5 |
635050 |
| Magnesium aluminate single crystal substrate 99.99 % |
MgAl2O4 |
<100> |
Cubic |
a = 8.083 |
2130 |
3.64 |
8 |
635073 |
| Magnesium aluminate single crystal substrate 99.99 % |
MgAl2O4 |
<110> |
Cubic |
a = 8.083 |
2130 |
3.64 |
8 |
634840 |
| Magnesium aluminate single crystal substrate 99.99 % |
MgAl2O4 |
<111> |
Cubic |
a = 8.083 |
2130 |
3.64 |
8 |
634832 |
| Magnesium oxide 99.9+ % single crystal substrate |
MgO |
<100> |
Cubic |
a = 4.216 |
2852 |
3.58 |
5.8 |
634646 |
| Magnesium oxide single crystal substrate |
MgO |
<110> |
Cubic |
a = 4.216 |
2852 |
3.58 |
5.8 |
634700 |
| Magnesium oxide single crystal substrate |
MgO |
<111> |
Cubic |
a = 4.216 |
2852 |
3.58 |
5.8 |
634697 |
| Silicon dioxide single crystal substrate 99.99 % |
SiO2 |
(0001) |
Hexagonal |
a = 4.914, c = 5.405 |
1610 |
2.684 |
7 |
634867 |
| Strontium lanthanum aluminate single crystal substrate 99.99 % |
SrLaAlO4 |
<001> |
Tetragonal |
a = 3.756, c = 12.63 |
1650 |
5.924 |
– |
634891 |
| Strontium lanthanum aluminate single crystal substrate 99.9+ % |
SrLaAlO4 |
<100> |
Tetragonal |
a = 3.756, c = 12.63 |
1650 |
5.924 |
– |
635111 |
| Strontium titanate single crystal substrate |
SrTiO3 |
<100> |
Cubic
|
a = 3.905 |
2080 |
5.175 |
6 |
634689 |
| Strontium titanate single crystal substrate |
SrTiO3 |
<110> |
Cubic |
a = 3.905 |
2080 |
5.175 |
6 |
634670 |
| Strontium titanate 99.99 % single crystal substrate |
SrTiO3 |
<111> |
Cubic |
a = 3.905 |
2080 |
5.175 |
6 |
638161 |
| Titanium(IV) oxide single crystal substrate 99.99 % |
TiO2 |
<001> |
Tetragonal
|
a =4.5936, c = 2.9582 |
1840 |
4.26 |
7 |
635057 |
| Titanium(IV) oxide single crystal substrate 99.99 % |
TiO2 |
<100> |
Tetragonal |
a =4.5936, c = 2.9582
|
1840 |
4.26 |
7 |
635049 |
| Titanium(IV) oxide single crystal substrate 99.99 % |
TiO2 |
<110> |
Tetragonal |
a =4.5936, c = 2.9582
|
1840 |
4.26 |
7 |
635065 |
| Yttrium vanadate single crystal substrate 99.99 % |
YVO4 |
<110> |
Tetragonal |
a = 7.12, c = 6.29 |
1825 |
4.22 |
5 |
635103 |
| *LSAT=Lanthanum Strontium Aluminum Tantalum oxide |
| III-V Single Crystal Substrates |
| Product Name |
Formula |
Orientation |
Semiconductor Type |
Carrier Concentration (cm-3) |
Mobility (cm2/V·sec) |
Resistivity (Ω·cm) |
EPD (cm-2) |
Product # |
| Gallium antiminide |
GaSb |
(100) |
P |
1.0 – 2.0 x 1017
|
600 – 800 |
~0.1 |
<1000 |
651478 |
| Gallium arsenide |
GaAs |
(100) |
N (semi-insulating) |
– |
>4500 |
>1 x 107 |
<5 x 104 |
651486 |
| Gallium phosphide |
GaP |
(111) |
N (semi-insulating) |
4 – 6 x 1016 |
– |
~ 0.3 |
– |
651494 |
| Silicon Wafers |
| Product Name |
Diameter (in) |
Orientation |
Dopant |
Conductor Type |
Resistivity (Ω·cm) |
Product # |
| Silicon wafer |
2 |
(100) |
none |
P |
102 – 104 |
646687 |
| Silicon wafer |
3 |
(100) |
none |
P |
102 – 104 |
647535 |
| Silicon wafer, doped |
2 |
(100) |
phosphorus |
N |
10-3 – 40 |
647780 |
| Silicon wafer, doped |
3 |
(100) |
phosphorus |
N |
10-3 – 40 |
647802 |
| Silicon wafer, doped |
2 |
(100) |
boron |
P |
10-3 – 40 |
647675 |
| Silicon wafer, doped |
3 |
(100) |
boron |
P |
10-3 – 40 |
647764 |
| Silicon wafer |
2 |
(111) |
none |
P |
102 – 104 |
647101 |
| Silicon wafer |
3 |
(111) |
none |
P |
102 – 104 |
647543 |
| Silicon wafer, doped |
2 |
(111) |
phosphorus |
N |
10-3 – 40 |
647799 |
| Silicon wafer, doped |
3 |
(111) |
phosphorus |
N |
10-3 – 40 |
647810 |
| Silicon wafer, doped |
2 |
(111) |
boron |
P |
10-3 – 40 |
647705 |
| Silicon wafer, doped |
3 |
(111) |
boron |
P |
10-3 – 40 |
647772 |
|
|