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 The EpiVapor™ system builds on proven EpiFill™ technology [1,2] to offer gas phase delivery of chemical vapors directly to multiple deposition tools in a safe, reproducible fashion.
Flux stability ensures processes can be run at full capacity without stoppages to change out tool bubblers thus maximising efficiency and reducing operational costs without compromising ultra high performance levels.
Specifically designed for pyrophoric, highly sensitive compounds the EpiVapor™ system is supported by a team of experts focussed on safe handling of these materials without contamination to consistently meet and surpass semiconductor quality standards.
Ref [1] = Patent WO0142539
Ref [2] = Patent WO0212780
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