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Material Performance Evaluation
SAFC Hitech - Silicon Semiconductor
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To meet customer needs, SAFC Hitech has a robust process to bring new product to market. A critical “fit-for-use” assessment is performed on each new material developed in order to evaluate new precursor performance and it potential. This process is conducted in several stages:
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By measuring properties such as vapor pressure, boiling point, Thermo Gravimetric Analysis (TGA) and particle count, physical properties are established to ensure that volatility, stability and reactivity are suited to precursor delivery approaches.
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To identify the proper material for your application, purity evaluation is performed to recognize which impurities need to be avoided or eliminated. We establish the contamination levels for organics, metalorganics and metals, and later compare impurity incorporation efficiencies so specifications can be established to ensure ultra-high film quality.
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To enhance our understanding of how materials deposit, we employ growth studies. Relying on in-house capabilities or strategic collaborations, we use techniques such as Chemical Vapor Deposition (CVD) and ALD to measure key electrical and optical properties of the deposited film upon the layer, resulting in a superior understanding of the preferred molecule.
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From Sample evaluation through high-volume manufacturing our customers can count on us to provide integrity and performance of the process solution.
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