High Purity Deposition Gases

Chemfiles Volume 4 Article 3

High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are also used as dopants in CVD and ion-implantation processes. Deuterated gases have been shown to improve device performance and reliability. ISOTEC™, a key member of the Sigma-Aldrich family, produces our stable isotope product lines. Led by an impressive group of expert scientists, ISOTEC™ routinely engages in multiple step syntheses of complex labeled molecules including the stable isotope labeling patterns 13C, 15N, 17O, 18O, 2H. ISOTEC™ has a large inventory of stable isotope labeled starting material to accommodate any researcher’s need. Contact ISOTEC™ at www.sigma-aldrich.com/isotec.

              Water H2 N2 O2 CH4  
Catalog Number Product Name Formula Purity (%) bp °C Vapor density (vs. Air) Critical Temp °C (ppm) Other
463051 Diborane 
(10% in H2)
B2H6 99.99* -92.5  
463132 Diborane-d6 
(10% in D2)
B2D6 99.99* -92.5  
463140 Diborane-d6 
(10% in He)
B2D6 99.99* -92.5  
463078 Digermane 
(10% in H2)
Ge2H6 99.99 31.5 150.9  
463043 Disilane Si2H6 99.998 -14.5 150.9 <1 <1 <1 <50 higher silanes
463027 Germane GeH4 99.997 -88.4 1.53 
(-142 °C)
35 <1 <50 <2 <0.5 <20 digermane
462993 Methylsilane CH3SiH3 99.9 -57 0.628 
(-58 °C)
  <10 <2 <50 <100 higher silanes
295647 Phosphine PH3 99.9995 -87.5 1.15 51.3 <1 <1 <1 <1 <1 AsH3
463124 Phosphine-d3 PD3 98 atom % -87.5    
333891 Silane SiH4 99.998 -112 1.1 -3.4 <1 <100 <2 – – <5 higher silanes
463116 Silane-d4 SiD4 98 atom% -112    
396354 Tetramethyl-germanium (CH3)4Ge 98% 43.5 0.978  
463094 Trimethylboron (CH3)3B 98.35 -20.2 2.3 <50 <10 <1 <100 <1000 N (CH3)3
463426 Trimethylboron-d9 (CD3)3B 99 atom % -20.2 2.3    
*As diborane

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