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666610
Tetrakis(dimethylamido)hafnium(IV)
packaged for use in deposition systems
Synonym(s):
TDMAH, Tetrakis(dimethylamino)hafnium(IV)
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About This Item
Linear Formula:
[(CH3)2N]4Hf
CAS Number:
Molecular Weight:
354.79
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
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Product Name
Tetrakis(dimethylamido)hafnium(IV), packaged for use in deposition systems
InChI
1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
SMILES string
CN(C)[Hf](N(C)C)(N(C)C)N(C)C
InChI key
ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
assay
≥99.99% (trace metals analysis)
form
low-melting solid
reaction suitability
core: hafnium
mp
26-29 °C (lit.)
density
1.098 g/mL at 25 °C
Quality Level
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Related Categories
1 of 4
This Item | 455199 | 455202 | 553123 |
|---|---|---|---|
| form low-melting solid | form low-melting solid | form liquid | form liquid |
| assay ≥99.99% (trace metals analysis) | assay ≥99.99% | assay 99.99% | assay ≥99.99% trace metals basis |
| mp 26-29 °C (lit.) | mp 26-29 °C (lit.) | mp - | mp <-50 °C |
| density 1.098 g/mL at 25 °C | density 1.098 g/mL at 25 °C | density 1.249 g/mL at 25 °C (lit.) | density 1.324 g/mL at 25 °C (lit.) |
| reaction suitability core: hafnium | reaction suitability core: hafnium | reaction suitability core: hafnium | reaction suitability core: hafnium |
| Quality Level 100 | Quality Level 100 | Quality Level 100 | Quality Level 200 |
Application
signalword
Danger
hcodes
Hazard Classifications
Flam. Sol. 1 - Skin Corr. 1B - Water-react 2
supp_hazards
Storage Class
4.3 - Hazardous materials which set free flammable gases upon contact with water
wgk
WGK 3
flash_point_f
109.4 °F - closed cup
flash_point_c
43 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
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Applied Physics Letters, 91, 193503-193503 (2007)
Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
Hausmann DM, Gordon RG
Journal of Crystal Growth, 249, 251-261 (2003)
High Purity Metalorganic Precursors for CPV Device Fabrication
Rushworth S
Material Matters, 5(4) null
The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition
Monsma D, Becker J
Material Matters, 1(3), 5-5 (2006)
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