Skip to Content
Merck
  • Thin films of homopolymers and cylinder-forming diblock copolymers under shear.

Thin films of homopolymers and cylinder-forming diblock copolymers under shear.

ACS nano (2014-08-12)
Arash Nikoubashman, Raleigh L Davis, Brian T Michal, Paul M Chaikin, Richard A Register, Athanassios Z Panagiotopoulos
ABSTRACT

We study thin films of homopolymers (PS) and monolayers of cylinder-forming diblock copolymers (PS–PHMA) under shear. To this end, we employed both experiments and computer simulations that correctly take into account hydrodynamic interactions and chain entanglements. Excellent quantitative agreement for static as well as dynamic properties in both the homopolymer and diblock copolymer cases was achieved. In particular, we found that the homopolymer thin films exhibit a distinct shear thinning behavior, which is strongly correlated with the disentanglement and shear alignment of the constituent polymer chains. For the PS–PHMA films, we show that shear can be employed to induce long-range ordering to the spontaneously self-assembled microdomains, which is required for many applications such as the fabrication of nanowire arrays. We found that the impact of chemical incompatibility on the viscosity is only minor in shear-aligned films. Once the domains were aligned, the films exhibited an almost Newtonian response to shear because the cylindrical microdomains acted as guide rails, along which the constituent copolymer chains could simply slide. Furthermore, we developed a model for predicting the onset of shear alignment based on equilibrium dynamics data, and found good agreement with our shear simulations. The employed computational method holds promise for a faster and more cost-effective route for developing custom tailored materials.

MATERIALS
Product Number
Brand
Product Description

Supelco
Methanol, Pharmaceutical Secondary Standard; Certified Reference Material
Supelco
Residual Solvent - Toluene, Pharmaceutical Secondary Standard; Certified Reference Material
Sigma-Aldrich
Methanol, suitable for HPLC, gradient grade, suitable as ACS-grade LC reagent, ≥99.9%
Sigma-Aldrich
Methanol, HPLC Plus, ≥99.9%
Sigma-Aldrich
Methanol, ACS reagent, ≥99.8%
Sigma-Aldrich
Lithium chloride, anhydrous, free-flowing, Redi-Dri, ACS reagent, ≥99%
Sigma-Aldrich
Methanol, Absolute - Acetone free
Sigma-Aldrich
Methanol, ACS spectrophotometric grade, ≥99.9%
Sigma-Aldrich
Lithium chloride, ReagentPlus®, 99%
Sigma-Aldrich
Lithium chloride, ACS reagent, ≥99%
Sigma-Aldrich
Methanol, ACS reagent, ≥99.8%
Sigma-Aldrich
Lithium chloride, anhydrous, free-flowing, Redi-Dri, ReagentPlus®, 99%
Sigma-Aldrich
Tetrahydrofuran, contains 200-400 ppm BHT as inhibitor, ACS reagent, ≥99.0%
Sigma-Aldrich
Methanol, ACS reagent, ≥99.8%
Sigma-Aldrich
Tetrahydrofuran, ACS reagent, ≥99.0%, contains 200-400 ppm BHT as inhibitor
Sigma-Aldrich
Methanol, BioReagent, ≥99.93%
Sigma-Aldrich
Methanol, suitable for HPLC, ≥99.9%
Sigma-Aldrich
Tetrahydrofuran, inhibitor-free, suitable for HPLC, ≥99.9%
Sigma-Aldrich
Methanol, suitable for NMR (reference standard)
Sigma-Aldrich
Lithium-7Li chloride, 99 atom % 7Li, 99% (CP)
Sigma-Aldrich
Lithium chloride, Molecular Biology, ≥99%
Supelco
Tetrahydrofuran, Selectophore, ≥99.5%
Sigma-Aldrich
Tetrahydrofuran, anhydrous, ≥99.9%, inhibitor-free
Supelco
Tetrahydrofuran, HPLC grade, ≥99.9%, inhibitor-free
Sigma-Aldrich
Lithium chloride, AnhydroBeads, −10 mesh, ≥99.9% trace metals basis
Sigma-Aldrich
Lithium chloride, powder, ≥99.98% trace metals basis
Sigma-Aldrich
Lithium chloride, AnhydroBeads, −10 mesh, 99.998% trace metals basis
Sigma-Aldrich
Tetrahydrofuran, anhydrous, contains 250 ppm BHT as inhibitor, ≥99.9%
Sigma-Aldrich
Methanol, anhydrous, 99.8%
Sigma-Aldrich
Lithium chloride, BioUltra, Molecular Biology, anhydrous, ≥99.0% (AT)