69.3 mmHg ( 60 °C)
heat of vaporization: ~41.9 kJ/mol (Dimer)
125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg
15 °C (lit.)
0.752 g/mL at 25 °C (lit.)
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Ask a Scientist here.
Some of the most innovative uses for atomic layer deposition (ALD) include synthesis of novel structures, area-selective deposition of materials, low-temperature ALD deposition, and temperature-sensitive subtrates.
Atomic layer deposition (ALD) techniques have emerged in the last ten years to meet various needs including semiconductor device miniaturization, conformal deposition on porous structures and coating of nanoparticles. ALD is based on two sequential self-limiting surface reactions.
Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of sequential cycles of precursor vapors.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
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