Todas as fotos(1)

767514

Sigma-Aldrich

Tantalum

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis

Sinônimo(s):
Ta
Empirical Formula (Hill Notation):
Ta
Número CAS:
Peso molecular:
180.95
Número EC:
Número MDL:
ID de substância PubChem:
NACRES:
NA.23

Nível de qualidade

100

pressão de vapor

<0.01 mmHg ( 537.2 °C)

teor

99.95% trace metals basis

forma

foil

temperatura de autoignição

572 °F

reaction suitability

core: tantalum

resistividade

13.5 μΩ-cm, 20°C

diâmetro × espessura

2.00 in. × 0.25 in.

pb

5425 °C (lit.)

pf

2996 °C (lit.)

densidade

16.69 g/cm3 (lit.)

SMILES string

[Ta]

InChI

1S/Ta

InChI key

GUVRBAGPIYLISA-UHFFFAOYSA-N

Aplicação

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Embalagem

1 ea in rigid mailer

Storage Class Code

13 - Non Combustible Solids

WGK Alemanha

nwg

Ponto de fulgor (ºF)

Not applicable

Ponto de fulgor (ºC)

Not applicable

Certificado de análise

Certificado de origem

Kostantinidis; S.;
The European Physical Journal - Applied Physics, 56(2), 24002/1-24002/1 (2011)
Helmersson; U.;
Thin Solid Films, 513(1-2), 1-1 (2006)
Robert Cohen
American journal of orthopedics (Belle Mead, N.J.), 31(4), 216-217 (2002-05-15)
Conventional materials used for orthopedic reconstruction implants limit the design of new and improved implants. Solid metal is rigid. Porous fixation surfaces have low volumetric porosity available for biologic ingrowth and low frictional characteristics for initial implant stability and have...
J Black
Clinical materials, 16(3), 167-173 (1993-12-09)
A detailed literature search was carried out to define the current knowledge about the biological performance of tantalum. The pure metal appears, to a great degree, to be inert both in vivo and in vitro. Both the pure metal and...
Jian Lu et al.
Zhongguo xiu fu chong jian wai ke za zhi = Zhongguo xiufu chongjian waike zazhi = Chinese journal of reparative and reconstructive surgery, 26(2), 244-247 (2012-03-13)
To review the progress in the treatment of bone defect by porous tantalum implant. Recent literature was extensively reviewed and summarized, concerning the treatment method of bone defect by porous tantalum implant. By right of their unique properties, porous tantalum...

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