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Sigma-Aldrich
Titanium, wire, diam. 0.127 mm, 99.99% trace metals basis
Sigma-Aldrich
Silicon, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.999% trace metals basis
Sigma-Aldrich
Nickel, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis
Sigma-Aldrich
Silicon, wafer (single side polished), <111>, N-type, contains no dopant, diam. × thickness 3 in. × 0.5 mm
Sigma-Aldrich
Silicon, wafer, <111>, P-type, contains boron as dopant, diam. × thickness 2 in. × 0.3 mm
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Silicon, wafer (single side polished), contains phosphorus as dopant, <111>, N-type, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
Silicon, wafer (single side polished), <111>, N-type, contains no dopant, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
Silicon, wafer (single side polished), <100>, N-type, contains phosphorus as dopant, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
Silicon, wafer (single side polished), <100>, N-type, contains no dopant, diam. × thickness 3 in. × 0.5 mm
Sigma-Aldrich
Silicon, wafer (single side polished), <100>, P-type, contains boron as dopant, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
Silicon, wafer (single side polished), <100>, P-type, contains boron as dopant, diam. × thickness 3 in. × 0.5 mm
Sigma-Aldrich
Silicon, wafer (single side polished), <111>, P-type, contains boron as dopant, diam. × thickness 3 in. × 0.5 mm
Sigma-Aldrich
Silicon, wafer (single side polished), <100>, N-type, contains no dopant, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
Silicon, nanopowder, <100 nm particle size (TEM), ≥98% trace metals basis
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Titanium, sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis
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Copper, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis
Sigma-Aldrich
Titanium, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis
Sigma-Aldrich
Copper, nanopowder, 60-80 nm particle size (SAXS), ≥99.5% trace metals basis
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Copper, nanopowder, 40-60 nm particle size (SAXS), ≥99.5% trace metals basis
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Taurine, ≥99%
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DL-Homocysteine, ≥95% (titration)
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(+)-α-Tocopherol, Type VI, from vegetable oil, liquid (≥0.88M based on potency, density and molecular wt.), BioReagent, suitable for insect cell culture, ≥1000 IU/g
Supelco
Taurine, Pharmaceutical Secondary Standard; Certified Reference Material
Sigma-Aldrich
Bismuth, powder, −100 mesh, 99% trace metals basis
Sigma-Aldrich
Bismuth, beads, 1-5 mm, 99.999% trace metals basis
Sigma-Aldrich
Titanium, foil, thickness 0.127 mm, ≥99.99% trace metals basis
Sigma-Aldrich
Raney®-Nickel, W.R. Grace and Co. Raney® 2400, slurry, in H2O, active catalyst
Sigma-Aldrich
Tungsten, wire, diam. 1.0 mm, 99.99% trace metals basis
Sigma-Aldrich
Bismuth, shot, 4-30 mesh, 99.9% trace metals basis
Sigma-Aldrich
Titanium, rod, diam. 6.35 mm, 99.99% trace metals basis