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Silylethyne-Substituted Pentacenes
Silylethyne-Substituted Pentacenes
Molecule Based Magnets
Tutorial in Magnetic Materials - Molecule-Based Magnets.
High Purity Metalorganic Precursors for CPV Device Fabrication
High Purity Metalorganic Precursors for CPV Device Fabrication
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Recent Progress in Spintronic Materials
Spin-based electronic (spintronic) devices offer significant improvement to the limits of conventional charge-based memory and logic devices which suffer from high power usage, leakage current, performance saturation, and device complexity.
Molybdenum Disulfide: Understanding Hydrogen Evolution Catalysis
The production of hydrogen by catalytic water splitting is important for a wide range of industries including renewable energy petroleum refining and for the production of methanol and ammonia in the chemical industry.
ALD — A Versatile Tool for Nanostructuring
In recent years considerable interest in ALD has emerged, mainly due to its ability to controllably coat even very small structures, e.g. nanoor microstructures.
Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications
Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications
The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition
igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.
Group 11 Thin Films by Atomic Layer Deposition
Copper metal deposition processes are an essential tool for depositing interconnects used in microelectronic applications, giving group 11 (coinage metals: Copper, Silver, and Gold) an important place in atomic layer deposition (ALD) process development.
Metal-Organic Complexes for Doping Organic Semiconductors and Surface Doping
The conductivity of organic semiconductors can be increased, and the barriers to charge-carrier injection from other materials can be reduced, by the use of highly reducing or oxidizing species to n- or p-dope, respectively, the semiconductor.
Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
Optimal Water Purification for Silica Sensitive Applications
Compare RO vs. EDI vs. ion exchange resins to remove silica from water for silica-sensitive applications (e.g. microelectronics, testing chambers, autoclaves, sterilizers, …).