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464635

Sigma-Aldrich

Trifluoromethanesulfonimide

≥95.0% (19F-NMR)

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Synonym(s):
Bis(trifluoromethanesulfonyl)amine
Linear Formula:
(CF3SO2)2NH
Molecular Weight:
281.15
Beilstein:
4754101
MDL number:
PubChem Substance ID:
NACRES:
NA.22

Quality Level

Assay

≥95.0% (19F-NMR)

form

solid

bp

90-91 °C (lit.)

mp

46-57 °C (lit.)

SMILES string

FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F

InChI

1S/C2HF6NO4S2/c3-1(4,5)14(10,11)9-15(12,13)2(6,7)8/h9H

InChI key

ZXMGHDIOOHOAAE-UHFFFAOYSA-N

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This Item
29597378175638455
Trifluoromethanesulfonimide ≥95.0% (19F-NMR)

464635

Trifluoromethanesulfonimide

Trifluoromethanesulfonamide 95%

638455

Trifluoromethanesulfonamide

bp

90-91 °C (lit.)

bp

-

bp

-

bp

-

form

solid

form

solid

form

crystals

form

solid

mp

46-57 °C (lit.)

mp

100-102 °C (lit.)

mp

100-102 °C (lit.)

mp

120-124 °C (lit.)

General description

Trifluoromethanesulfonimide is a promising Bronsted acid catalyst and is superior to scandium triflate in catalytic action.

Application

Trifluoromethanesulfonimide may be used as a catalyst for the preparation of 1-substituted-1H-1,2,3,4-tetrazoles.

Pictograms

CorrosionSkull and crossbones

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 3 Oral - Aquatic Chronic 3 - Eye Dam. 1

Storage Class Code

6.1D - Non-combustible, acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects

WGK

WGK 3

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Trifluoromethanesulfonimide catalysed synthesis of 1-substituted-1H-1, 2, 3, 4-tetrazoles using glycerol as green solvent at room temperature.
Wang H, et al.
J. Chem. Res. (M), 40(9), 570-572 (2016)
Practical Synthesis of (?)-a-Tocopherol. Trifluoromethanesulfonimide as an Extremely Active Br?nsted Acid Catalyst for the Condensation of Trimethylhydroquinone with Isophytol.
Ishihara K, et al.
Synlett, 11, 1045-1046 (1996)
Youngbum Kim et al.
Nanoscale, 10(18), 8851-8858 (2018-05-02)
The exciton-dominated light emission of two-dimensional (2D) semiconductors is determined largely by the doping state and the formation of defects. Extensive studies have shown that chemical treatment critically modifies the doping state and defect state of chemical vapor deposition (CVD)-grown

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