Name: 氧化铪(IV)
Brand: ALDRICH

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经验公式（希尔记法）:

HfO₂

CAS Number:

分子量:

210.49

EC號碼:

MDL號碼:

分類程式碼代碼:

12352303

PubChem物質ID:

NACRES:

NA.23

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98%

powder

9.68 g/mL at 25 °C (lit.)

O=[Hf]=O

1S/Hf.2O

CJNBYAVZURUTKZ-UHFFFAOYSA-N

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Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).