651842

Sigma-Aldrich

金蚀刻剂,与镍相容

MDL number:
NACRES:
NA.23

Quality Level

vapor density

9 (vs air)

vapor pressure

0.3 mmHg ( 15 °C)

composition

volatiles, 50-80%

bp

100 °C/1 atm

solubility

H2O: miscible at 20 °C

General description

Nickel compatible gold etchant is an etching solution that can be used in the removal of the gold layer from the surface. Compatibility of gold etchants with nickel allows it to be utilized in applications where nickel is used as a dominant material in the fabrication of micro-electro-mechanical systems (MEMS).

Packaging

500 mL in glass bottle

Application

用于金的可选通用蚀刻剂。可与负性和正性光致抗蚀剂相容。

Features and Benefits

易于以最少的底切控制蚀刻。室温下操作。无氰化物,不侵蚀镍膜。

Pictograms

Health hazard

Signal Word

Danger

Hazard Statements

Precautionary Statements

Target Organs

Thyroid

Personal Protective Equipment

dust mask type N95 (US),Eyeshields,Gloves

RIDADR

NONH for all modes of transport

WGK Germany

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Micro-elastometry on whole blood clots using actuated surface-attached posts (ASAPs)
Judith RM, et al.
Lab on a chip, 15(5), 1385-1393 (2015)
Determination of young's modulus of electrochemically co-deposited Ni-Al2O3 nanocomposite
Wei X, et al.
Materials Letters, 62(12-13), 1916-1918 (2008)
A monolithic micro-optical interferometer deep etched into fused silica
Weigel C, et al.
Microelectronic Engineering, 174(5), 40-45 (2017)
实验方案
Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenience. Etchants are available separately so that the proper etchant can be chosen for a variety of substrate choices.
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