Merck

715166

Sigma-Aldrich

十八烷基膦酸

97%

别名:
ODPA, 磷酸正十八酯
Empirical Formula (Hill Notation):
C18H39O3P
CAS号:
分子量:
334.47
MDL编号:
PubChem化学物质编号:
NACRES:
NA.23

检测方案

97%

形式

crystals

mp

95-100 °C

SMILES string

CCCCCCCCCCCCCCCCCCP(O)(O)=O

InChI

1S/C18H39O3P/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-22(19,20)21/h2-18H2,1H3,(H2,19,20,21)

InChI key

FTMKAMVLFVRZQX-UHFFFAOYSA-N

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此商品
735914736244685801
Octadecylphosphonic acid 97%

Sigma-Aldrich

715166

十八烷基膦酸

Octylphosphonic acid 97%

Sigma-Aldrich

735914

辛基膦酸

Hexadecylphosphonic acid 97%

Sigma-Aldrich

736244

Hexadecylphosphonic acid

16-Phosphonohexadecanoic acid 97%

Sigma-Aldrich

685801

16-膦酰基十六烷酸

form

crystals

form

solid

form

solid

form

solid

mp

95-100 °C

mp

93-98 °C

mp

88-93 °C

mp

129-133 °C

一般描述

十八烷基膦酸(OPA)可用作自组装单层膜,其可形成与不同金属氧化物的表面原子牢固结合的表面活性剂。与主要使用的硅烷相比,它具有疏水性并可覆盖更大的表面积。

应用

白铜(CuNi)上的防腐涂层可以通过浸涂法在OPA的保护膜上形成。OPA可用于制备氧化铟(In2O3)纳米线晶体管,并可能用于快速转换和低噪音纳米电子器件的增长。它可以在铜网上形成超疏水层,因此可用于自清洁和油/水分离应用。

象形图

Exclamation mark

警示用语:

Warning

危险声明

危险分类

Eye Irrit. 2 - Skin Irrit. 2

储存分类代码

11 - Combustible Solids

WGK

WGK 3


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Propylphosphonic acid 95%

Sigma-Aldrich

305685

丙基膦酸

Trioctylphosphine oxide ReagentPlus®, 99%

Sigma-Aldrich

223301

三辛基氧化膦

Dihexadecyl phosphate

Sigma-Aldrich

D2631

双十六烷基磷酸酯

n-Octadecylphosphonic acid grafted mesoporous magnetic nanoparticle: Preparation, characterization, and application in magnetic solid-phase extraction.
Ding J, et al.
Journal of Chromatography A, 1217(47), 7351-7358 (2010)
Resistance of Superhydrophobic Surface-Functionalized TiO2 Nanotubes to Corrosion and Intense Cavitation.
Hua W.
Nanomaterials, 8(10), 783-783 (2018)
Fast formation of superhydrophobic octadecylphosphonic acid (ODPA) coating for self-cleaning and oil/water separation.
Dai C, et al.
Soft Matter, 10(40), 8116-8121 (2014)
Getachew Tizazu et al.
Langmuir : the ACS journal of surfaces and colloids, 25(18), 10746-10753 (2009-07-18)
Electron-hole pair formation at titania surfaces leads to the formation of reactive species that degrade organic materials. Here, we describe the degradation of self-assembled monolayers of alkylphosphonic acids on the native oxide of titanium following exposure to UV light. The
Fabrication of controllable and stable In2O3 nanowire transistors using an octadecylphosphonic acid self-assembled monolayer.
Lim T, et al.
Nanotechnology, 26(14), 145203-145203 (2015)

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