所有图片(3)

306576

Sigma-Aldrich

氢氧化钠

pellets, semiconductor grade, 99.99% trace metals basis

别名:
苛性钠
线性分子式:
NaOH
CAS号:
分子量:
40.00
EC 号:
MDL编号:
PubChem化学物质编号:
NACRES:
NA.21

质量水平

200

等级

semiconductor grade

蒸汽密度

>1 (vs air)

蒸汽压

<18 mmHg ( 20 °C)
3 mmHg ( 37 °C)

测定

99.99% trace metals basis

形式

pellets

technique(s)

HPLC: suitable

杂质

<1% Na2CO3

mp

318 °C (lit.)

溶解性

water: soluble 1,260 g/L at 20 °C

密度

2.13 g/cm3 at 20 °C

SMILES string

[OH-].[Na+]

InChI

1S/Na.H2O/h;1H2/q+1;/p-1

InChI key

HEMHJVSKTPXQMS-UHFFFAOYSA-M

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象形图

Corrosion

警示用语:

Danger

危险声明

危险分类

Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1A

储存分类代码

8B - Non-combustible, corrosive hazardous materials

WGK

WGK 1

闪点(F)

Not applicable

闪点(C)

Not applicable

分析证书

原产地证书 (CofO)

Chemoselective, solvent-free aldol condensation reaction.
Raston CL and Scott JL.
Green Chemistry, 22(2), 49-52 (2000)
Silvio Carrettin et al.
Chemical communications (Cambridge, England), (7)(7), 696-697 (2002-07-18)
Glycerol is oxidised to glyceric acid with 100% selectivity using either 1% Au/charcoal or 1% Au/graphite catalyst under mild reaction conditions (60 degrees C, 3 h, water as solvent).
Determination of specific surface area of colloidal silica by titration with sodium hydroxide.
Sears Jr GW.
Analytical Chemistry, 28(12), 1981-1983 (1956)
M A Roberts et al.
Analytical chemistry, 69(11), 2035-2042 (1997-06-01)
This report describes a UV laser photoablation method for the production of miniaturized liquid-handling systems on polymer substrate chips. The fabrication of fluid channel and reservoir networks is accomplished by firing 200 mJ pulses from an UV excimer laser at
Kinetics of sodium borohydride direct oxidation and oxygen reduction in sodium hydroxide electrolyte: Part I. BH4- electro-oxidation on Au and Ag catalysts.
Chatenet M, et al.
Electrochimica Acta, 51(25), 5459-5467 (2006)

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