Chemical vapor deposition

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Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of sequential cycles of precursor vapors.

Atomic Layer Deposition (ALD) — A Versatile Tool for Nanostructuring

Some of the most innovative uses for atomic layer deposition (ALD) include synthesis of novel structures, area-selective deposition of materials, low-temperature ALD deposition, and temperature-sensitive subtrates.

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Group 11 Thin Films by Atomic Layer Deposition

Copper metal deposition processes are an essential tool for depositing interconnects used in microelectronic applications, giving group 11 (coinage metals: Copper, Silver, and Gold) an important place in atomic layer deposition (ALD) process development.

Silylethyne-Substituted Pentacenes

High Purity Metalorganic Precursors for CPV Device Fabrication

Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand.

Molybdenum Disulfide: Understanding Hydrogen Evolution Catalysis

The production of hydrogen by catalytic water splitting is important for a wide range of industries including renewable energy petroleum refining and for the production of methanol and ammonia in the chemical industry.

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

Metal-Organic Complexes for Doping Organic Semiconductors and Surface Doping

The conductivity of organic semiconductors can be increased, and the barriers to charge-carrier injection from other materials can be reduced, by the use of highly reducing or oxidizing species to n- or p-dope, respectively, the semiconductor.

Recent Progress in Spintronic Materials

Spin-based electronic (spintronic) devices offer significant improvement to the limits of conventional charge-based memory and logic devices which suffer from high power usage, leakage current, performance saturation, and device complexity.

Optimal Water Purification for Silica Sensitive Applications

Compare RO vs. EDI vs. ion exchange resins to remove silica from water for silica-sensitive applications (e.g. microelectronics, testing chambers, autoclaves, sterilizers, …).