过氧化氢 溶液 contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis

过氧化氢 溶液

过氧化氢 溶液 contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis
别名:
过氧化氢 溶液
Empirical Formula (Hill Notation):
H2O2
CAS号:
分子量:
34.01

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过氧化氢 溶液, 30 % (w/w) in H2O, contains stabilizer
过氧化氢 溶液, contains inhibitor, 30 wt. % in H2O, ACS reagent
过氧化氢 溶液, 50 wt. % in H2O, stabilized
过氧化氢 溶液, 3%, suitable for microbiology
过氧化氢 溶液, ≥30%, for trace analysis
过氧化氢 溶液, contains ~200 ppm acetanilide as stabilizer, 3 wt. % in H2O
过氧化氢 溶液, 30% (w/w), puriss. p.a., reag. ISO, reag. Ph. Eur.
过氧化氢 溶液, 30 % (w/w), for ultratrace analysis
过氧化氢 溶液, 34.5-36.5%
过氧化氢 溶液, contains inhibitor, 30 wt. % in H2O, meets USP testing specifications
过氧化氢 溶液, contains inhibitor, 35 wt. % in H2O
过氧化氢 溶液, tested according to Ph. Eur.
过氧化氢 溶液, purum p.a., ≥35% (RT)
过氧化氢 溶液, contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis