• 主页
  • 查找结果
  • Effects of pH and elevated glucose levels on the electrochemical behavior of dental implants.

Effects of pH and elevated glucose levels on the electrochemical behavior of dental implants.

The Journal of oral implantology (2014-05-02)
Evsen Tamam, Ilser Turkyilmaz
摘要

Implant failure is more likely to occur in persons with medically compromising systemic conditions, such as diabetes related to high blood glucose levels and inflammatory diseases related to pH levels lower than those in healthy people. The aim of this study was to investigate the effects of lower pH level and simulated- hyperglycemia on implant corrosion as these effects are critical to biocompatibility and osseointegration. The electrochemical corrosion properties of titanium implants were studied in four different solutions: Ringer's physiological solution at pH = 7.0 and pH = 5.5 and Ringer's physiological solution containing 15 mM dextrose at pH = 7 and pH = 5.5. Corrosion behaviors of dental implants were determined by cyclic polarization test and electrochemical impedance spectroscopy. Surface alterations were studied using a scanning electron microscope. All test electrolytes led to apparent differences in corrosion behavior of the implants. The implants under conditions of test exhibited statistically significant increases in I(corr) from 0.2372 to 1.007 μAcm(-2), corrosion rates from 1.904 to 8.085 mpy, and a decrease in polarization resistances from 304 to 74 Ω. Implants in dextrose-containing solutions were more prone to corrosion than those in Ringer's solutions alone. Increasing the acidity also yielded greater corrosion rates for the dextrose-containing solutions and the solutions without dextrose.

材料
货号
品牌
产品描述

Sigma-Aldrich
D -(+)-葡萄糖, ≥99.5% (GC)
Sigma-Aldrich
D -(+)-葡萄糖 溶液, 45% in H2O, sterile-filtered, BioXtra, suitable for cell culture
Sigma-Aldrich
D -(+)-葡萄糖, powder, BioReagent, suitable for cell culture, suitable for insect cell culture, suitable for plant cell culture, ≥99.5%
Sigma-Aldrich
D -(+)-葡萄糖, ACS reagent
Sigma-Aldrich
D -(+)-葡萄糖, BioXtra, ≥99.5% (GC)
Sigma-Aldrich
D -(+)-葡萄糖 溶液, 100 g/L in H2O, sterile-filtered, BioXtra, suitable for cell culture
Sigma-Aldrich
葡萄糖, meets EP, BP, JP, USP testing specifications, anhydrous
Supelco
葡萄糖, Pharmaceutical Secondary Standard; Certified Reference Material
Supelco
D-(+)-葡萄糖, analytical standard
Sigma-Aldrich
D -(+)-葡萄糖, BioUltra, anhydrous, ≥99.5% (sum of enantiomers, HPLC)
Sigma-Aldrich
钛, foil, thickness 0.127 mm, 99.7% trace metals basis
Sigma-Aldrich
L - (−) -葡萄糖, ≥99%
USP
右旋糖, United States Pharmacopeia (USP) Reference Standard
Supelco
D -(+)-葡萄糖, analytical standard
Sigma-Aldrich
钛, foil, thickness 0.25 mm, 99.7% trace metals basis
Sigma-Aldrich
钛, powder, <45 μm avg. part. size, 99.98% trace metals basis
Sigma-Aldrich
D -(+)-葡萄糖, suitable for mouse embryo cell culture, ≥99.5% (GC)
Sigma-Aldrich
D -(+)-葡萄糖, Hybri-Max, powder, BioReagent, suitable for hybridoma
Sigma-Aldrich
钛, powder, −100 mesh, 99.7% trace metals basis
Sigma-Aldrich
钛, foil, thickness 0.025 mm, 99.98% trace metals basis
Sigma-Aldrich
钛, sponge, 3-19 mm, 99.5% trace metals basis
Sigma-Aldrich
钛, wire, diam. 0.25 mm, 99.7% trace metals basis
Sigma-Aldrich
D -(+)-葡萄糖, tested according to Ph. Eur.
Supelco
D -(+)-葡萄糖 溶液, 1 mg/mL in 0.1% benzoic acid, standard for enzymatic assay kits GAGO20, GAHK20, STA20, analytical standard
Sigma-Aldrich
钛, nanoparticles, dispersion, <100 nm particle size, in mineral oil, 98.5% trace metals basis
Sigma-Aldrich
钛, foil, thickness 2.0 mm, 99.7% trace metals basis
Sigma-Aldrich
钛, foil, thickness 0.1 mm, 99.99% trace metals basis
Sigma-Aldrich
钛, crystalline, 5-10 mm, ≥99.99% trace metals basis (purity exclusive of Na and K content)
Sigma-Aldrich
钛, foil, thickness 0.5 mm, 99.99% trace metals basis
Sigma-Aldrich
钛, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis

社交媒体

LinkedIn icon
Twitter icon
Facebook Icon
Instagram Icon

Merck

科研、开发、生产。

作为生命科学行业的全球领先供应商,我们致力于为科研、生物技术开发和生产,以及制药药物疗法开发和生产提供各类解决方案和服务。

© 2021年版权归德国达姆施塔特默克集团(Merck KGaA)及/或其附属公司所有。版权所有。

未经许可,严禁复制本网站上的任何资料。