648663

ビス(エチルシクロペンタジエニル)ルテニウム(II)

• 別名: ジエチルルテノセン
• 化学式: C₇H₉RuC₇H₉
• CAS番号: 32992-96-4
• 分子量: 287.36
• NACRES: NA.23
• PubChem Substance ID: 24883596
• UNSPSC Code: 12352103
• MDL number: MFCD03427334

特性

• Quality Segment: 100
• form: liquid
• composition: Ru, 33.9-36.4% gravimetric
• reaction suitability: core: ruthenium, reagent type: catalyst
• refractive index: n20/D 1.5870 (lit.)
• bp: 100 °C/0.01 mmHg (lit.)
• mp: 6 °C (lit.)
• density: 1.3412 g/mL at 25 °C (lit.)
• storage temp.: −20°C
• SMILES string: [Ru].CC[C]1[CH][CH][CH][CH]1.CC[C]2[CH][CH][CH][CH]2
• InChI: 1S/2C7H9.Ru/c2*1-2-7-5-3-4-6-7;/h2*3-6H,2H2,1H3;
• InChI key: VLTZUJBHIUUHIK-UHFFFAOYSA-N

詳細

General description

Bis(ethylcyclopentadienyl)ruthenium(II) is a organometallic compound widely used as a catalyst and as a precursor for thin-film deposition. It is valued for its high thermal stability, volatility, and efficiency in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes to create high-purity ruthenium and ruthenium oxide films. This compound plays a crucial role in microelectronics, catalysis, and energy materials.

Application

Bis(ethylcyclopentadienyl)ruthenium can be used:

• A precursor to synthesize ruthenium films via the atomic layer deposition (ALD) method.
• A precursor to synthesize ruthenium thin films on substrates such as SiO2 via plasma enhanced atomic layer deposition (PEALD) method.
• A metal-organic precursor in the chemical vapor deposition (CVD) process to deposit ruthenium (Ru) thin films suitable for applications like capacitor electrodes in microelectronics.
• A precursor to prepare ultrathin ruthenium (Ru) films via the atomic layer deposition (ALD) and selective etching techniques.

Features and Benefits

Bis(ethylcyclopentadienyl)ruthenium(II) exhibits:

• High Volatility: Suitable for gas-phase delivery in Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD).
• Thermal Stability: Stable under typical ALD/CVD processing temperatures

安全性情報

• pictograms: GHS07
• signalword: Warning
• hcodes: H315,H319,H335
• pcodes: P261 - P264 - P271 - P280 - P302 + P352 - P305 + P351 + P338
• Hazard Classifications: Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
• target_organs: Respiratory system
• 保管分類: 10 - Combustible liquids
• wgk: WGK 3
• flash_point_f: >199.9 °F - closed cup
• flash_point_c: > 93.3 °C - closed cup
• ppe: Eyeshields, Gloves, type ABEK (EN14387) respirator filter